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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 23 — Nov. 10, 2008
  • pp: 18881–18888

Near- to far-field imaging of phase evolution of light emanating from a metal nanoslit

Yun Suk Jung, Yonggang Xi, Jeff Wuenschell, and Hong Koo Kim  »View Author Affiliations


Optics Express, Vol. 16, Issue 23, pp. 18881-18888 (2008)
http://dx.doi.org/10.1364/OE.16.018881


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Abstract

We report near- to far-field measurement of optical wavefronts emanating from a nanoslit formed in a thin (50 nm thick) Ag film. The evolution of optical phases is imaged using a self-interference technique in conjunction with a scanning probe method. The phase relationship of the slit-transmitted waves with respect to the direct transmission through the thin metal film is quantitatively established. The singular-phase points resulting from the interplay of slit diffraction and surface plasmons are identified in the intermediate-field region.

© 2008 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(240.6680) Optics at surfaces : Surface plasmons
(260.3910) Physical optics : Metal optics
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Diffraction and Gratings

History
Original Manuscript: September 25, 2008
Revised Manuscript: October 27, 2008
Manuscript Accepted: October 27, 2008
Published: October 31, 2008

Citation
Yun Suk Jung, Yonggang Xi, Jeff Wuenschell, and Hong Koo Kim, "Near- to far-field imaging of phase evolution of light emanating from a metal nanoslit," Opt. Express 16, 18881-18888 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-23-18881


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