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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 23 — Nov. 10, 2008
  • pp: 19354–19365

Large area uniform nanostructures fabricated by direct femtosecond laser ablation

Min Huang, Fuli Zhao, Ya Cheng, Ningsheng Xu, and Zhizhan Xu  »View Author Affiliations

Optics Express, Vol. 16, Issue 23, pp. 19354-19365 (2008)

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An approach for fabricating large area uniform nanostructures by direct femtosecond (fs) laser ablation is presented. By the simple scanning technique with appropriate irradiation conditions, arbitrary size of uniform, complanate nano-grating, nano-particle, and nano-square structures can be produced on wide bandgap materials as well as graphite. The feature sizes of the formed nanostructures, which can be tuned in a wide range by varying the irradiation wavelength, is about 200 nm with 800 nm fs laser irradiation. The physical properties of the nano-structured surfaces are changed greatly, especially the optical property, which is demonstrated by the extraordinary enhancement of light transmission of the treated area. This technique is efficient, universal, and environmentally friendly, which exhibits great potential for applications in photoelectron devices.

© 2008 Optical Society of America

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(220.4241) Optical design and fabrication : Nanostructure fabrication
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Laser Micromachining

Original Manuscript: August 14, 2008
Revised Manuscript: October 29, 2008
Manuscript Accepted: November 2, 2008
Published: November 7, 2008

Min Huang, Fuli Zhao, Ya Cheng, Ningsheng Xu, and Zhizhan Xu, "Large area uniform nanostructures fabricated by direct femtosecond laser ablation," Opt. Express 16, 19354-19365 (2008)

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