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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 24 — Nov. 24, 2008
  • pp: 19512–19519

Diamond waveguides fabricated by reactive ion etching

Mark P. Hiscocks, Kumaravelu Ganesan, Brant C. Gibson, Shane T. Huntington, François Ladouceur, and Steven Prawer  »View Author Affiliations

Optics Express, Vol. 16, Issue 24, pp. 19512-19519 (2008)

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We demonstrate for the first time the feasibility of all-diamond integrated optic devices over large areas using a combination of photolithography, reactive ion etching (RIE) and focused ion beam (FIB) techniques. We confirm the viability of this scalable process by demonstrating guidance in a two-moded ridge waveguide in type 1b single crystal diamond. This opens the door to the fabrication of a diamond-based optical chip integrating functional elements such as X-crossings, Y-junctions, evanescent couplers, Bragg reflectors/couplers and various interferometers.

© 2008 Optical Society of America

OCIS Codes
(110.5220) Imaging systems : Photolithography
(220.1920) Optical design and fabrication : Diamond machining
(230.7370) Optical devices : Waveguides
(270.5565) Quantum optics : Quantum communications

ToC Category:
Integrated Optics

Original Manuscript: September 23, 2008
Revised Manuscript: October 21, 2008
Manuscript Accepted: October 23, 2008
Published: November 10, 2008

Mark P. Hiscocks, Kumaravelu Ganesan, Brant C. Gibson, Shane T. Huntington, François Ladouceur, and Steven Prawer, "Diamond waveguides fabricated by reactive ion etching," Opt. Express 16, 19512-19519 (2008)

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