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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 25 — Dec. 8, 2008
  • pp: 21022–21031

High speed volumetric thickness profile measurement based on full-field wavelength scanning interferometer

Jang-Woo You, Soohyun Kim, and Daesuk Kim  »View Author Affiliations


Optics Express, Vol. 16, Issue 25, pp. 21022-21031 (2008)
http://dx.doi.org/10.1364/OE.16.021022


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Abstract

A novel high speed volumetric thickness profilometry based on a wavelength scanning full-field interferometer and its signal processing algorithm is described for a thin film deposited on pattern structures. A specially designed Michelson interferometer with a blocking plate in the reference path enables us to measure the volumetric thickness profile by decoupling two variables, thickness and profile, which affect the total phase function ϕ(k). We show experimentally that the proposed method provides a much faster solution in obtaining the volumetric thickness profile data while maintaining the similar level of accurate measurement capability as that of the least square fitting method.

© 2008 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(120.3930) Instrumentation, measurement, and metrology : Metrological instrumentation

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: September 12, 2008
Revised Manuscript: November 25, 2008
Manuscript Accepted: November 25, 2008
Published: December 4, 2008

Citation
Jang-Woo You, Soohyun Kim, and Daesuk Kim, "High speed volumetric thickness profile measurement based on full-field wavelength scanning interferometer," Opt. Express 16, 21022-21031 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-25-21022


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