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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 4 — Feb. 18, 2008
  • pp: 2302–2314

Dielectric functions of a growing silver film determined using dynamic in situ spectroscopic ellipsometry

T. W. H. Oates, L. Ryves, and M. M. M. Bilek  »View Author Affiliations


Optics Express, Vol. 16, Issue 4, pp. 2302-2314 (2008)
http://dx.doi.org/10.1364/OE.16.002302


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Abstract

The dielectric functions of plasma deposited silver on SiO2 through all stages of Volmer-Weber growth at room temperature and 150°C were determined unambiguously by applying a model-independent inversion method to dynamic in situ spectroscopic ellipsometric data. The results show large differences in the localized plasmon resonance and the percolation threshold at the two temperatures. Using these model-independent dielectric functions we assess the effectiveness of modelling the plasmon resonance by fitting a Lorentz oscillator. The methods show agreement for the position of the plasmon resonance below the percolation threshold and for the effective film thickness up to 5.6 nm at room temperature and 11.5 nm at 150°C, however the line shape of the resonance is described by the Lorentzian only in the early stages of film growth.

© 2008 Optical Society of America

OCIS Codes
(310.6860) Thin films : Thin films, optical properties
(160.4236) Materials : Nanomaterials
(240.2130) Optics at surfaces : Ellipsometry and polarimetry

ToC Category:
Thin Films

History
Original Manuscript: January 8, 2008
Revised Manuscript: January 28, 2008
Manuscript Accepted: January 29, 2008
Published: February 4, 2008

Citation
T. W. H. Oates, L. Ryves, and M. M. M. Bilek, "Dielectric functions of a growing silver film determined using dynamic in situ spectroscopic ellipsometry," Opt. Express 16, 2302-2314 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-4-2302


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