Electro-optic and electro-absorption characterization of InAs quantum dot waveguides
Optics Express, Vol. 16, Issue 5, pp. 3439-3444 (2008)
http://dx.doi.org/10.1364/OE.16.003439
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Abstract
Optical properties of multilayer InAs quantum dot waveguides, grown by molecular beam epitaxy, have been studied under applied electric field. Fabry-Perot measurements at 1515 nm on InAs/GaAs quantum dot structures yield a significantly enhanced linear electro-optic efficiency compared to bulk GaAs. Electro-absorption measurements at 1300 nm showed increased absorption with applied field accompanied with red shift of the spectra. Spectral shifts of up to 21% under 18 Volt bias was observed at 1320 nm.
© 2008 Optical Society of America
OCIS Codes
(230.4110) Optical devices : Modulators
(250.7360) Optoelectronics : Waveguide modulators
ToC Category:
Optoelectronics
History
Original Manuscript: December 3, 2007
Revised Manuscript: January 27, 2008
Manuscript Accepted: January 29, 2008
Published: February 29, 2008
Citation
Imran B. Akca, Aykutlu Dana, Atilla Aydinli, Marco Rossetti, Lianhe Li, Andrea Fiore, and Nadir Dagli, "Electro-optic and electro-absorption characterization of InAs quantum dot waveguides," Opt. Express 16, 3439-3444 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-5-3439
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