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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 6 — Mar. 17, 2008
  • pp: 3589–3603

Electromagnetic ray tracing model for line structures

C. B. Tan, A. Khoh, and S. H. Yeo  »View Author Affiliations

Optics Express, Vol. 16, Issue 6, pp. 3589-3603 (2008)

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In this paper, a model for electromagnetic scattering of line structures is established based on high frequency approximation approach - ray tracing. This electromagnetic ray tracing (ERT) model gives the advantage of identifying each physical field that contributes to the total solution of the scattering phenomenon. Besides the geometrical optics field, different diffracted fields associated with the line structures are also discussed and formulated. A step by step addition of each electromagnetic field is given to elucidate the causes of a disturbance in the amplitude profile. The accuracy of the ERT model is also discussed by comparing with the reference finite difference time domain (FDTD) solution, which shows a promising result for a single polysilicon line structure with width of as narrow as 0.4 wavelength.

© 2008 Optical Society of America

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(050.1960) Diffraction and gratings : Diffraction theory
(080.0080) Geometric optics : Geometric optics
(080.2720) Geometric optics : Mathematical methods (general)

ToC Category:
Diffraction and Gratings

Original Manuscript: January 23, 2008
Revised Manuscript: February 25, 2008
Manuscript Accepted: February 26, 2008
Published: March 4, 2008

C. B. Tan, A. Khoh, and S. H. Yeo, "Electromagnetic ray tracing model for line structures," Opt. Express 16, 3589-3603 (2008)

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  1. C. B. Tan, S. H. Yeo, H. P. Koh, C. K. Koo, Y. M. Foong, and Y. K. Siew, "Evaluation of alignment marks using ASML ATHENA alignment system in 90 nm BEOL process," Proc. SPIE 5038, 1211-1218 (2003). [CrossRef]
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