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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 6 — Mar. 17, 2008
  • pp: 3970–3975

Metrology of optically-unresolved features using interferometric surface profiling and RCWA modeling

Peter de Groot, Xavier Colonna de Lega, Jan Liesener, and Michael Darwin  »View Author Affiliations

Optics Express, Vol. 16, Issue 6, pp. 3970-3975 (2008)

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Rigorous coupled wave analysis (RCWA) interprets 3D white-light interference microscopy profiles and reveals the dimensions of optically-unresolved surface features. Measurements of silicon etch depth of a 450-nm pitch grating structure correlate to atomic force microscopy with R2 = 0.995 and a repeatability of 0.11nm. This same technique achieves a <1nm sensitivity to 80-nm lateral widths of 190-nm pitch gratings using a 570-nm mean wavelength.

© 2008 Optical Society of America

OCIS Codes
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(180.6900) Microscopy : Three-dimensional microscopy

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: January 22, 2008
Revised Manuscript: March 3, 2008
Manuscript Accepted: March 3, 2008
Published: March 10, 2008

Virtual Issues
Vol. 3, Iss. 4 Virtual Journal for Biomedical Optics

Peter De Groot, Xavier Colonna de Lega, Jan Liesener, and Michael Darwin, "Metrology of optically-unresolved features using interferometric surface profiling and RCWA modeling," Opt. Express 16, 3970-3975 (2008)

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