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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 6 — Mar. 17, 2008
  • pp: 4217–4227

Subwavelength imaging with anisotropic structure comprising alternately layered metal and dielectric films

Changtao Wang, Yanhui Zhao, Dachun Gan, Chunlei Du, and Xiangang Luo  »View Author Affiliations


Optics Express, Vol. 16, Issue 6, pp. 4217-4227 (2008)
http://dx.doi.org/10.1364/OE.16.004217


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Abstract

Subwavelength imaging can be obtained with alternately layered metallodielectric films structure, even when the permittivity of metal and dielectric are not matched. This occurs as the effective transversal permittivity tends to be zero or the vertical one approaches infinity, depending on the permittivity value of the utilized dielectric and metal material. Evanescent waves can be amplified through the structure, but not in a manner of fully compensating the exponentially decaying property in dielectric. Numerical illustration of subwavelength imaging is presented for variant configuration of anisotropic permittivity with finite layer number of metallodielectric films.

© 2008 Optical Society of America

OCIS Codes
(050.1940) Diffraction and gratings : Diffraction
(230.4170) Optical devices : Multilayers
(240.6680) Optics at surfaces : Surface plasmons
(260.3910) Physical optics : Metal optics
(350.5500) Other areas of optics : Propagation

ToC Category:
Imaging Systems

History
Original Manuscript: October 23, 2007
Revised Manuscript: January 26, 2008
Manuscript Accepted: January 27, 2008
Published: March 12, 2008

Citation
Changtao Wang, Yanhui Zhao, Dachun Gan, Chunlei Du, and Xiangang Luo, "Subwavelength imaging with anisotropic structure comprising alternately layered metal and dielectric films," Opt. Express 16, 4217-4227 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-6-4217


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