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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 16, Iss. 9 — Apr. 28, 2008
  • pp: 6592–6599

Direct electron beam writing of electro-optic polymer microring resonators

Haishan Sun, Antao Chen, Benjamin C. Olbricht, Joshua A. Davies , Philip A. Sullivan, Yi Liao , and Larry R. Dalton  »View Author Affiliations


Optics Express, Vol. 16, Issue 9, pp. 6592-6599 (2008)
http://dx.doi.org/10.1364/OE.16.006592


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Abstract

Electro-optic polymer waveguides in electron beam sensitive polymethyl methacrylate (PMMA) polymer matrix doped with organic nonlinear chromophores could be directly patterned by electron beam exposure with high resolution and smoothness. The polymer in the exposed regions was removed with standard electron beam resist developer and without damaging the chromophore containing polymer waveguides. Feature sizes on the order of 100 nm could be clearly resolved. High quality microring resonators made of YL124/PMMA electro-optic polymer were successfully fabricated with this technique. The measured resonance extinction ratios were more than 16 dB and quality factors were in the range of 103~104.

© 2008 Optical Society of America

OCIS Codes
(160.2100) Materials : Electro-optical materials
(230.5750) Optical devices : Resonators
(220.4241) Optical design and fabrication : Nanostructure fabrication
(130.5460) Integrated optics : Polymer waveguides

ToC Category:
Integrated Optics

History
Original Manuscript: February 14, 2008
Revised Manuscript: March 21, 2008
Manuscript Accepted: March 27, 2008
Published: April 24, 2008

Citation
Haishan Sun, Antao Chen, Benjamin C. Olbricht, Joshua A. Davies, Philip A. Sullivan, Yi Liao, and Larry R. Dalton, "Direct electron beam writing of electro-optic polymer microring resonators," Opt. Express 16, 6592-6599 (2008)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-16-9-6592


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