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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 1 — Jan. 5, 2009
  • pp: 156–162

Electroluminescent devices based on amorphous SiN/Si quantum dots/amorphous SiN sandwiched structures

J. Zhou, G. R. Chen, Y. Liu, J. Xu, T. Wang, N. Wan, Z. Y. Ma, W. Li, C. Song, and K. J. Chen  »View Author Affiliations

Optics Express, Vol. 17, Issue 1, pp. 156-162 (2009)

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A single layer of dense Si quantum dots with average size of 4 nm sandwiched in amorphous SiN layers was prepared by laser crystallization of ultrathin amorphous Si film followed by subsequently thermal annealing. The electroluminescent diodes were fabricated by evaporating Al electrodes on back sides of p-Si substrates and the top surface of samples. Room temperature electroluminescence can be detected with applying the negative voltage around 10V on the top gate electrode and the luminescent intensity is increased with increasing the applied voltage. It was found that the integrated luminescent intensity is linearly proportional to the injection current which suggested the intensity depends on the concentrations of injected carriers after Fowler-Nordheim tunneling through amorphous SiN barriers. The influence of the amorphous SiN with different band gap on the device performance was also discussed briefly.

© 2009 Optical Society of America

OCIS Codes
(160.4236) Materials : Nanomaterials

ToC Category:

Original Manuscript: August 20, 2008
Revised Manuscript: October 23, 2008
Manuscript Accepted: November 10, 2008
Published: December 24, 2008

J. Zhou, G. R. Chen, Y. Liu, J. Xu, T. Wang, N. Wan, Z. Y. Ma, W. Li, C. Song, and K. J. Chen, "Electroluminescent devices based on amorphous SiN/Si quantum dots/amorphous SiN sandwiched structures," Opt. Express 17, 156-162 (2009)

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