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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 10 — May. 11, 2009
  • pp: 7922–7932

Realization and characterization of an XUV multilayer coating for attosecond pulses

Michele Suman, Gianni Monaco, Maria Guglielmina Pelizzo, David L. Windt, and Piergiorgio Nicolosi  »View Author Affiliations

Optics Express, Vol. 17, Issue 10, pp. 7922-7932 (2009)

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The experimental characterization of an aperiodic reflecting multilayer (ML) structure designed to reflect and compress attosecond pulses in the extreme ultraviolet spectral region is presented. The MLs are designed for the 75–105 eV spectral interval with suitable reflectance and phase behavior, in particular high total spectral reflectivity coupled with very wide bandwidth and spectral phase compensation. The experimental phase behavior of the multilayer has been obtained through electron photoemission signal using an innovative method that is presented and discussed in this paper. With this ML we have demonstrated pulse compression by reflection from 450 as to 130 as.

© 2009 Optical Society of America

OCIS Codes
(120.3940) Instrumentation, measurement, and metrology : Metrology
(120.5050) Instrumentation, measurement, and metrology : Phase measurement
(320.5520) Ultrafast optics : Pulse compression
(310.4165) Thin films : Multilayer design

ToC Category:
Thin Films

Original Manuscript: March 18, 2009
Revised Manuscript: April 11, 2009
Manuscript Accepted: April 20, 2009
Published: April 28, 2009

Michele Suman, Gianni Monaco, Maria-Guglielmina Pelizzo, David L. Windt, and Piergiorgio Nicolosi, "Realization and characterization of an XUV multilayer coating for attosecond pulses," Opt. Express 17, 7922-7932 (2009)

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