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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 10 — May. 11, 2009
  • pp: 8621–8629

Two-dimensional photonic crystal color filter development

Eun-Hyoung Cho, Hae-Sung Kim, Byoung-Ho Cheong, Prudnikov Oleg, Wenxu Xianyua, Jin-Seung Sohn, Dong-Joon Ma, Hwan-Young Choi, No-Cheol Park, and Young-Pil Park  »View Author Affiliations

Optics Express, Vol. 17, Issue 10, pp. 8621-8629 (2009)

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Reflective color filters using two-dimensional photonic crystals based on sub-wavelength gratings were proposed and constructed. Using low-cost nanoimprint lithography, an amorphous silicon layer was deposited through the low-temperature PECVD process and patterned into two-dimensional structures. The isolated amorphous silicon patterns were readily crystallized using a multi-shot excimer laser annealing at low energy. A study of the close relationship between color filter reflectance and silicon pattern crystallinity is introduced. Theoretical and experimental results show that the proposed color filters have high reflectance and, moreover, decrease the dependence on incident angle compared to one-dimensional photonic crystal color filters.

© 2009 OSA

OCIS Codes
(350.4238) Other areas of optics : Nanophotonics and photonic crystals
(220.4241) Optical design and fabrication : Nanostructure fabrication
(230.7408) Optical devices : Wavelength filtering devices

ToC Category:
Photonic Crystals

Original Manuscript: February 24, 2009
Revised Manuscript: April 28, 2009
Manuscript Accepted: April 28, 2009
Published: May 7, 2009

Eun-Hyoung Cho, Hae-Sung Kim, Byoung-Ho Cheong, Prudnikov Oleg, Wenxu Xianyua, Jin-Seung Sohn, Dong-Joon Ma, Hwan-Young Choi, No-Cheol Park, and Young-Pil Park, "Two-dimensional photonic crystal color filter development," Opt. Express 17, 8621-8629 (2009)

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