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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 12 — Jun. 8, 2009
  • pp: 10304–10318

Beat the diffraction limit in 3D direct laser writing in photosensitive glass

Matthieu Bellec, Arnaud Royon, Bruno Bousquet, Kevin Bourhis, Mona Treguer, Thierry Cardinal, Martin Richardson, and Lionel Canioni  »View Author Affiliations

Optics Express, Vol. 17, Issue 12, pp. 10304-10318 (2009)

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Three-dimensional (3D) femtosecond laser direct structuring in transparent materials is widely used for photonic applications. However, the structure size is limited by the optical diffraction. Here we report on a direct laser writing technique that produces subwavelength nanostructures independently of the experimental limiting factors. We demonstrate 3D nanostructures of arbitrary patterns with feature sizes down to 80 nm, less than one tenth of the laser processing wavelength. Its ease of implementation for novel nanostructuring, with its accompanying high precision will open new opportunities for the fabrication of nanostructures for plasmonic and photonic devices and for applications in metamaterials.

© 2009 OSA

OCIS Codes
(190.4720) Nonlinear optics : Optical nonlinearities of condensed matter
(320.2250) Ultrafast optics : Femtosecond phenomena
(350.3450) Other areas of optics : Laser-induced chemistry
(160.5335) Materials : Photosensitive materials

ToC Category:
Laser Microfabrication

Original Manuscript: April 22, 2009
Revised Manuscript: May 25, 2009
Manuscript Accepted: May 26, 2009
Published: June 4, 2009

Matthieu Bellec, Arnaud Royon, Bruno Bousquet, Kevin Bourhis, Mona Treguer, Thierry Cardinal, Martin Richardson, and Lionel Canioni, "Beat the diffraction limit in 3D direct laser writing in photosensitive glass," Opt. Express 17, 10304-10318 (2009)

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