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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 12 — Jun. 8, 2009
  • pp: 9515–9525

Ultrafast laser photoinscription of polarization sensitive devices in bulk silica glass

G. Cheng, K. Mishchik, C. Mauclair, E. Audouard, and R. Stoian  »View Author Affiliations


Optics Express, Vol. 17, Issue 12, pp. 9515-9525 (2009)
http://dx.doi.org/10.1364/OE.17.009515


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Abstract

Ultrashort pulsed laser irradiation of bulk fused silica may result under specific energetic conditions in the self-organization of subwavelength material redistribution regions within the laser trace. The modulated structures have birefringent properties and show unusual anisotropic light scattering and reflection characteristics. We report here on the formation of waveguiding structures with remarkable polarization effects for infrared light. The photoinscription process using 800 nm femtosecond laser pulses is accompanied by third harmonic generation and polarization dependent anisotropic scattering of UV photons. The photowritten structures can be arranged in three-dimensional patterns generating complex propagation and polarization effects due to the anisotropic optical properties.

© 2009 Optical Society of America

OCIS Codes
(050.7330) Diffraction and gratings : Volume gratings
(140.3390) Lasers and laser optics : Laser materials processing
(160.6030) Materials : Silica
(220.4000) Optical design and fabrication : Microstructure fabrication
(320.2250) Ultrafast optics : Femtosecond phenomena
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Laser Microfabrication

History
Original Manuscript: March 10, 2009
Revised Manuscript: April 17, 2009
Manuscript Accepted: April 27, 2009
Published: May 22, 2009

Citation
G. Cheng, K. Mishchik, C. Mauclair, E. Audouard, and R. Stoian, "Ultrafast laser photoinscription of polarization sensitive devices in bulk silica glass," Opt. Express 17, 9515-9525 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-12-9515


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