193nm Superlens Imaging Structure for 20nm Lithography Node

doi:10.1364/OE.17.011309

193nm Superlens Imaging Structure for 20nm Lithography Node

Zhong Shi, Vladimir Kochergin, and Fei Wang »View Author Affiliations

Optics Express, Vol. 17, Issue 14, pp. 11309-11314 (2009)
http://dx.doi.org/10.1364/OE.17.011309

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Abstract
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References (16)
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Abstract

We are showing that a 20nm lithography resolution is theoretically feasible at a 193nm illumination wavelength if employing aluminum (Al) superlens structure with index matching layer. It is illustrated that transmissivity of evanescent waves for certain wavevector bands can be enhanced by an index matching layer. It is further shown a minimal resolution of ~λ/10 can be achieved by appropriately engineering mask material and superlens structure. A depth of focus of several nanometers is predicted to be possible for a periodic structure with 20nm half pitch. Assistant features were adopted in superlens structure to successfully suppress the side lobes and resolve a 20nm two-slit structure.

OCIS Codes
(240.6680) Optics at surfaces : Surface plasmons
(110.4235) Imaging systems : Nanolithography

ToC Category:
Imaging Systems

History
Original Manuscript: March 16, 2009
Revised Manuscript: May 15, 2009
Manuscript Accepted: June 15, 2009
Published: June 22, 2009

Citation
Zhong Shi, Vladimir Kochergin, and Fei Wang, "193nm Superlens Imaging Structure for 20nm Lithography Node," Opt. Express 17, 11309-11314 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-14-11309

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References

P. J. Silverman, "Extreme ultraviolet lithography: overview and development status," J. Microlith., Microfab. Microsyst. 4, 011006 (2005). [CrossRef]
M. D. Stewart, S. C. Johnson, S. V. Sreenivasan, D. J. Resnick, and C. G. Willson, "Nanofabrication with step and flash imprint lithography," J. Microlith., Microfab. Microsyst. 4, 011002 (2005). [CrossRef]
S. R. J. Brueck, "Optical and interferometric lithography - nanotechnology enablers," Proc. of IEEE 93, 1704-1721 (2005). [CrossRef]
M. M. Alkaisi, R. J. Blaikie, and S. J. Mcnab, "Nanolithography in the evanescent near field," Adv. Mater. 13, 877-887 (2001). [CrossRef]
V. G. Veselago, "The electrodynamics of substances with simultaneously negative values of ε and μ," Sov. Phys. USP 10, 509-514 (1968). [CrossRef]
J. B. Pendry, "Negative refraction makes a perfect lens," Phys. Rev. Lett. 85, 3966-3969 (2000). [CrossRef] [PubMed]
N. Fang, H. Lee, C. Sun, and X. Zhang, "Sub-diffraction-limited optical imaging with a silver superlens," Science 308, 534-537 (2005). [CrossRef] [PubMed]
H. Lee, Y. Xiong, N. Fang, W. Srituravanich, S. Durant, M. Ambati, C. Sun, and X. Zhang, "Realization of optical superlens imaging below the diffraction limit," New J. Phys. 7, 255 (2005). [CrossRef]
W. Srituravanich, N. Fang, S. Durant, M. Ambati, C. Sun, and X. Zhang, "Sub-100 nm lithography using ultrashort wavelength of surface plasmons," J. Vac. Sci. Technol. B 22, 3475-3478 (2004). [CrossRef]
E. D. Palik, Handbook of Optical Constants of Solids (Academic Press, 1985).
D. M. Roessler, D. R. Huffman, "Magnesium oxide (MgO)," in Handbook of Optical Constants of Solid II, E. D. Palik, ed. (Academic Press, 1991).
C. C. Katsidis and D. I. Siapkas, "General transfer-matrix method for optical multilayer systems with coherent, partially coherent, and incoherent interference," Appl. Opt. 41, 3978-3987 (2002). [CrossRef] [PubMed]
A. D. Rakic, A. B. Djurisic, J. M. Elazar, and M. L. Majewaki, "Optical properties of metallic films for vertical-cavity optoelectronic devices," Appl. Opt. 22, 5271-5283 (1998). [CrossRef]
S. A. Ramakrishna, "Physics of negative refractive index materials," Rep. Prog. Phys. 68, 449-521 (2005). [CrossRef]
H. J. Levinson, Principles of lithography, (SPIE Press, 2004).
M. A. Meitl, Z. Zhu, V. Kumar, K. J. Lee, X. Feng, Y. Y. Huang, I. Adesida, R. G. Nuzzo, and J. A. Rogers, "Transfer printing by kinetic control of adhesion to an elastomeric stamp," Nat. Mater. 5, 33-38 (2006). [CrossRef]

Adesida, I.
Alkaisi, M. M.
Ambati, M.
Blaikie, R. J.
Brueck, S. R. J.
Djurisic, A. B.
Durant, S.
Elazar, J. M.
Fang, N.
Feng, X.
Huang, Y. Y.
Johnson, S. C.
Katsidis, C. C.
Kumar, V.
Lee, H.
Lee, K. J.
Majewaki, M. L.
Mcnab, S. J.
Meitl, M. A.
Nuzzo, R. G.
Pendry, J. B.
Rakic, A. D.
Ramakrishna, S. A.
Resnick, D. J.
Rogers, J. A.
Siapkas, D. I.
Silverman, P. J.
Sreenivasan, S. V.
Srituravanich, W.
Stewart, M. D.
Sun, C.
Veselago, V. G.
Willson, C. G.
Xiong, Y.
Zhang, X.
Zhu, Z.

Adv. Mater.

M. M. Alkaisi, R. J. Blaikie, and S. J. Mcnab, "Nanolithography in the evanescent near field," Adv. Mater. 13, 877-887 (2001). [CrossRef]

Appl. Opt.

C. C. Katsidis and D. I. Siapkas, "General transfer-matrix method for optical multilayer systems with coherent, partially coherent, and incoherent interference," Appl. Opt. 41, 3978-3987 (2002). [CrossRef] [PubMed]
A. D. Rakic, A. B. Djurisic, J. M. Elazar, and M. L. Majewaki, "Optical properties of metallic films for vertical-cavity optoelectronic devices," Appl. Opt. 22, 5271-5283 (1998). [CrossRef]

J. Microlith., Microfab. Microsyst.

P. J. Silverman, "Extreme ultraviolet lithography: overview and development status," J. Microlith., Microfab. Microsyst. 4, 011006 (2005). [CrossRef]
M. D. Stewart, S. C. Johnson, S. V. Sreenivasan, D. J. Resnick, and C. G. Willson, "Nanofabrication with step and flash imprint lithography," J. Microlith., Microfab. Microsyst. 4, 011002 (2005). [CrossRef]

J. Vac. Sci. Technol. B

W. Srituravanich, N. Fang, S. Durant, M. Ambati, C. Sun, and X. Zhang, "Sub-100 nm lithography using ultrashort wavelength of surface plasmons," J. Vac. Sci. Technol. B 22, 3475-3478 (2004). [CrossRef]

Nat. Mater.

M. A. Meitl, Z. Zhu, V. Kumar, K. J. Lee, X. Feng, Y. Y. Huang, I. Adesida, R. G. Nuzzo, and J. A. Rogers, "Transfer printing by kinetic control of adhesion to an elastomeric stamp," Nat. Mater. 5, 33-38 (2006). [CrossRef]

New J. Phys.

H. Lee, Y. Xiong, N. Fang, W. Srituravanich, S. Durant, M. Ambati, C. Sun, and X. Zhang, "Realization of optical superlens imaging below the diffraction limit," New J. Phys. 7, 255 (2005). [CrossRef]

Phys. Rev. Lett.

J. B. Pendry, "Negative refraction makes a perfect lens," Phys. Rev. Lett. 85, 3966-3969 (2000). [CrossRef] [PubMed]

Proc. of IEEE

S. R. J. Brueck, "Optical and interferometric lithography - nanotechnology enablers," Proc. of IEEE 93, 1704-1721 (2005). [CrossRef]

Rep. Prog. Phys.

S. A. Ramakrishna, "Physics of negative refractive index materials," Rep. Prog. Phys. 68, 449-521 (2005). [CrossRef]

Science

N. Fang, H. Lee, C. Sun, and X. Zhang, "Sub-diffraction-limited optical imaging with a silver superlens," Science 308, 534-537 (2005). [CrossRef] [PubMed]

Sov. Phys. USP

V. G. Veselago, "The electrodynamics of substances with simultaneously negative values of ε and μ," Sov. Phys. USP 10, 509-514 (1968). [CrossRef]

Other

E. D. Palik, Handbook of Optical Constants of Solids (Academic Press, 1985).
D. M. Roessler, D. R. Huffman, "Magnesium oxide (MgO)," in Handbook of Optical Constants of Solid II, E. D. Palik, ed. (Academic Press, 1991).
H. J. Levinson, Principles of lithography, (SPIE Press, 2004).

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