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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 19 — Sep. 14, 2009
  • pp: 16783–16791

Plasmonic interference nanolithography with a double-layer planar silver lens structure

Beibei Zeng, Xufeng Yang, Changtao Wang, and Xiangang Luo  »View Author Affiliations

Optics Express, Vol. 17, Issue 19, pp. 16783-16791 (2009)

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We present here a surface plasmon interference lithography method with double-layer planar silver lens. This kind of lithography method provides interference patterns with sufficient contrast for lithography process and simple structure for the convenience of fabrication. Rigorous coupled wave analysis method has been performed with practical parameters to testify this lithography scheme. Furthermore, some key factors influencing the pattern quality have been discussed. It is pointed out that three factors mainly determine the resolution of the interference patterns, and therefore we give a theoretical resolution limit of about 1/12 wavelength to the surface plasmon interference lithography method.

© 2009 OSA

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(240.6680) Optics at surfaces : Surface plasmons
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Optical Design and Fabrication

Original Manuscript: July 1, 2009
Revised Manuscript: July 29, 2009
Manuscript Accepted: August 28, 2009
Published: September 4, 2009

Beibei Zeng, Xufeng Yang, Changtao Wang, and Xiangang Luo, "Plasmonic interference nanolithography with a double-layer planar silver lens structure," Opt. Express 17, 16783-16791 (2009)

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