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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 21 — Oct. 12, 2009
  • pp: 18513–18517

Electric-field-induced random lasing from ZnO and Mg0.1Zn0.9O films optically pumped with an extremely low intensity

Peiliang Chen, Xiangyang Ma, Dongsheng Li, Yuanyuan Zhang, and Deren Yang  »View Author Affiliations


Optics Express, Vol. 17, Issue 21, pp. 18513-18517 (2009)
http://dx.doi.org/10.1364/OE.17.018513


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Abstract

Ultraviolet random lasing from ZnO and Mg0.1Zn0.9O films have been achieved under optical pump of a continuous wave He-Cd laser as the films are simultaneously exerted by an electric-field with appropriate polarity and amplitude. With the aid of electric-field, the optical pump intensity for generating random lasing can be reduced at least five orders of magnitude in comparison with conventional pulse-laser pumped ones. It is believed that the role of electric-field exerted on the films is similar to that of increasing optical pump intensity, in terms of increasing the amount of non-equilibrium electrons in the near-surface regions of films.

© 2009 OSA

OCIS Codes
(140.5960) Lasers and laser optics : Semiconductor lasers
(160.6000) Materials : Semiconductor materials
(250.5230) Optoelectronics : Photoluminescence

ToC Category:
Lasers and Laser Optics

History
Original Manuscript: July 27, 2009
Revised Manuscript: September 24, 2009
Manuscript Accepted: September 24, 2009
Published: September 29, 2009

Citation
Peiliang Chen, Xiangyang Ma, Dongsheng Li, Yuanyuan Zhang, and Deren Yang, "Electric-field-induced random lasing from ZnO and Mg0.1Zn0.9O films optically pumped with an extremely low intensity," Opt. Express 17, 18513-18517 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-21-18513


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