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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 21 — Oct. 12, 2009
  • pp: 18518–18524

Tunable Bragg reflectors on silicon-on-insulator rib waveguides

Ivano Giuntoni, Andrzej Gajda, Michael Krause, Ralf Steingrüber, Jürgen Bruns, and Klaus Petermann  »View Author Affiliations


Optics Express, Vol. 17, Issue 21, pp. 18518-18524 (2009)
http://dx.doi.org/10.1364/OE.17.018518


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Abstract

We present the design, fabrication and characterization of Bragg reflectors on silicon-on-insulator rib waveguides. The fabrication is based on a new double lithographic process, combining electron-beam lithography for the grating and photolithography for the waveguides. This process allows the realization of low loss reflectors, which were fully characterized. The influence of the etching depth and of the waveguide geometry on the reflector performance is considered. We demonstrate a reflectivity larger than 80% over a bandwidth of 0.8 nm with an insertion loss of only 0.5 dB. A thermal tunability of the device is also considered, showing that a shift of the reflected wavelength of 77 pm/K is possible.

© 2009 OSA

OCIS Codes
(130.3120) Integrated optics : Integrated optics devices
(230.1480) Optical devices : Bragg reflectors

ToC Category:
Integrated Optics

History
Original Manuscript: July 22, 2009
Revised Manuscript: September 18, 2009
Manuscript Accepted: September 22, 2009
Published: September 29, 2009

Citation
Ivano Giuntoni, Andrzej Gajda, Michael Krause, Ralf Steingrüber, Jürgen Bruns, and Klaus Petermann, "Tunable Bragg reflectors on silicon-on-insulator rib waveguides," Opt. Express 17, 18518-18524 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-21-18518


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References

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