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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 21 — Oct. 12, 2009
  • pp: 18703–18713

Impact of storage induced outgassing organic contamination on laser induced damage of silica optics at 351 nm

K. Bien-Aimé, C. Belin, L. Gallais, P. Grua, E. Fargin, J. Néauport, and I. Tovena-Pecault  »View Author Affiliations


Optics Express, Vol. 17, Issue 21, pp. 18703-18713 (2009)
http://dx.doi.org/10.1364/OE.17.018703


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Abstract

The impact of storage conditions on laser induced damage density at 351 nm on bare fused polished silica samples has been studied. Intentionally outgassing of polypropylene pieces on silica samples was done. We evidenced an important increase of laser induced damage density on contaminated samples demonstrating that storage could limit optics lifetime performances. Atomic Force Microscopy (AFM) and Gas Chromatography -Mass Spectrometry (GC-MS) have been used to identify the potential causes of this effect. It shows that a small quantity of organic contamination deposited on silica surface is responsible for this degradation. Various hypotheses are proposed to explain the damage mechanism. The more likely hypothesis is a coupling between surface defects of optics and organic contaminants.

© 2009 OSA

OCIS Codes
(110.0180) Imaging systems : Microscopy
(140.3330) Lasers and laser optics : Laser damage
(220.5450) Optical design and fabrication : Polishing

ToC Category:
Lasers and Laser Optics

History
Original Manuscript: July 1, 2009
Revised Manuscript: August 13, 2009
Manuscript Accepted: August 24, 2009
Published: October 2, 2009

Citation
K. Bien-Aimé, C. Belin, L. Gallais, P. Grua, E. Fargin, J. Néauport, and I. Tovena-Pecault, "Impact of storage induced outgassing organic contamination on laser induced damage of silica optics at 351 nm," Opt. Express 17, 18703-18713 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-21-18703


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