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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 22 — Oct. 26, 2009
  • pp: 19476–19485

Plasmonic nano lithography with a high scan speed contact probe

Yongwoo Kim, Seok Kim, Howon Jung, Eungman Lee, and Jae W. Hahn  »View Author Affiliations


Optics Express, Vol. 17, Issue 22, pp. 19476-19485 (2009)
http://dx.doi.org/10.1364/OE.17.019476


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Abstract

We demonstrate plasmonic lithography with an optical contact probe to achieve high speed patterning without external gap distance control between the probe and the photoresist. The bottom surface of the probe is covered with a 10 nm thickness silica glass film for the gap distance control and coated with self-assembled monolayer (SAM) to reduce friction between the probe and the photoresist. We achieve a patterning resolution of ~50 nm and a patterning speed of ~10 mm/s. We obtain the quality of line patterning comparable to that in conventional optical lithography.

© 2009 OSA

OCIS Codes
(240.6680) Optics at surfaces : Surface plasmons
(110.4235) Imaging systems : Nanolithography
(220.4241) Optical design and fabrication : Nanostructure fabrication
(210.4245) Optical data storage : Near-field optical recording
(250.5403) Optoelectronics : Plasmonics

ToC Category:
Optics at Surfaces

History
Original Manuscript: September 2, 2009
Revised Manuscript: September 30, 2009
Manuscript Accepted: October 2, 2009
Published: October 13, 2009

Citation
Yongwoo Kim, Seok Kim, Howon Jung, Eungman Lee, and Jae W. Hahn, "Plasmonic nano lithography
 with a high scan speed contact probe," Opt. Express 17, 19476-19485 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-22-19476


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