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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 26 — Dec. 21, 2009
  • pp: 23522–23529

Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes

D. Elfström, B. Guilhabert, J. McKendry, S. Poland, Z. Gong, D. Massoubre, E. Richardson, B. R. Rae, G. Valentine, G. Blanco-Gomez, E. Gu, J.M. Cooper, R.K. Henderson, and M.D. Dawson  »View Author Affiliations


Optics Express, Vol. 17, Issue 26, pp. 23522-23529 (2009)
http://dx.doi.org/10.1364/OE.17.023522


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Abstract

We report on an approach to ultraviolet (UV) photolithography and direct writing where both the exposure pattern and dose are determined by a complementary metal oxide semiconductor (CMOS) controlled micro-pixellated light emitting diode array. The 370nm UV light from a demonstrator 8 x 8 gallium nitride micro-pixel LED is projected onto photoresist covered substrates using two back-to-back microscope objectives, allowing controlled demagnification. In the present setup, the system is capable of delivering up to 8.8W/cm2 per imaged pixel in circular spots of diameter ~8µm. We show example structures written in positive as well as in negative photoresist.

© 2009 OSA

OCIS Codes
(110.3960) Imaging systems : Microlithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.3670) Optical devices : Light-emitting diodes

ToC Category:
Imaging Systems

History
Original Manuscript: September 30, 2009
Manuscript Accepted: October 31, 2009
Published: December 8, 2009

Citation
D. Elfström, B. Guilhabert, J. McKendry, S. Poland, Z. Gong, D. Massoubre, E. Richardson, B. R. Rae, G. Valentine, G. Blanco-Gomez, E. Gu, J. M. Cooper, R. K. Henderson, and M. D. Dawson, "Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes," Opt. Express 17, 23522-23529 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-26-23522


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