Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes

doi:10.1364/OE.17.023522

Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes

D. Elfström, B. Guilhabert, J. McKendry, S. Poland, Z. Gong, D. Massoubre, E. Richardson, B. R. Rae, G. Valentine, G. Blanco-Gomez, E. Gu, J. M. Cooper, R. K. Henderson, and M. D. Dawson »View Author Affiliations

Optics Express, Vol. 17, Issue 26, pp. 23522-23529 (2009)
http://dx.doi.org/10.1364/OE.17.023522

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Abstract

We report on an approach to ultraviolet (UV) photolithography and direct writing where both the exposure pattern and dose are determined by a complementary metal oxide semiconductor (CMOS) controlled micro-pixellated light emitting diode array. The 370nm UV light from a demonstrator 8 x 8 gallium nitride micro-pixel LED is projected onto photoresist covered substrates using two back-to-back microscope objectives, allowing controlled demagnification. In the present setup, the system is capable of delivering up to 8.8W/cm² per imaged pixel in circular spots of diameter ~8µm. We show example structures written in positive as well as in negative photoresist.

OCIS Codes
(110.3960) Imaging systems : Microlithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(230.3670) Optical devices : Light-emitting diodes

ToC Category:
Imaging Systems

History
Original Manuscript: September 30, 2009
Manuscript Accepted: October 31, 2009
Published: December 8, 2009

Citation
D. Elfström, B. Guilhabert, J. McKendry, S. Poland, Z. Gong, D. Massoubre, E. Richardson, B. R. Rae, G. Valentine, G. Blanco-Gomez, E. Gu, J. M. Cooper, R. K. Henderson, and M. D. Dawson, "Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes," Opt. Express 17, 23522-23529 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-26-23522

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References

S. P. A. Fodor, J. L. Read, M. C. Pirrung, L. Stryer, A. T. Lu, and D. Solas, “Light-directed, spatially addressable parallel chemical synthesis,” Science 251(4995), 767–773 (1991). [CrossRef] [PubMed]
C. Rensch, S. Hell, M. Schickfus, and S. Hunklinger, “Laser scanner for direct writing lithography,” Appl. Opt. 28(17), 3754 (1989). [CrossRef] [PubMed]
R. M. Guijt and M. C. Breadmore, “Maskless photolithography using UV LEDs,” Lab Chip 8(8), 1402–1404 (2008). [CrossRef] [PubMed]
T. Naiser, T. Mai, W. Michel, and A. Ott, “Versatile maskless microscope projection photolithography system and its application in light-directed fabrication of DNA microarrays,” Rev. Sci. Instrum. 77(6), 063711 (2006). [CrossRef]
G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,” J. Vac. Sci. Technol. B 24(6), 2852 (2006). [CrossRef]
C. W. Jeon, E. Gu, and M. D. Dawson, “Mask-free photolithographic exposure using a matrix-addressable micropixellated AlInGaN ultraviolet light-emitting diode,” Appl. Phys. Lett. 86(22), 221105 (2005). [CrossRef]
H. X. Zhang, D. Massoubre, J. McKendry, Z. Gong, B. Guilhabert, C. Griffin, E. Gu, P. E. Jessop, J. M. Girkin, and M. D. Dawson, “Individually-addressable flip-chip AlInGaN micropixelated light emitting diode arrays with high continuous and nanosecond output power,” Opt. Express 16(13), 9918–9926 (2008). [CrossRef] [PubMed]
J. McKendry, B. R. Rae, Z. Gong, K. R. Muir, B. Guilhabert, D. Massoubre, E. Gu, D. Renshaw, M. D. Dawson, and R. K. Henderson, “Individually-Addressable AlInGaN Micro-LED Arrays with CMOS Control and Sub-Nanosecond Output Pulses,” IEEE Photon. Technol. Lett. 21(12), 811–813 (2009). [CrossRef]
A. Tan, K. Rodgers, J. P. Murrihy, C. O'Mathuna, and J. D. Glennon, “Rapid fabrication of microfluidic devices in poly(dimethylsiloxane) by photocopyingPresented at the 14th International Symposium on Microscale Separations and Analysis, Boston, January 13-18, 2001,” Lab Chip 1(1), 7 (2001). [CrossRef] [PubMed]
W. K. T. Coltro, E. Piccin, J. A. Fracassi da Silva, C. Lucio do Lago, and E. Carrilho, “A toner-mediated lithographic technology for rapid prototyping of glass microchannels,” Lab Chip 7(7), 931–934 (2007). [CrossRef] [PubMed]
M. H. Sorouraddin, M. Amjadi, and M. Safi-Shalamzari, “Simple and rapid methods for the fabrication of polymeric and glass chips for using in analytical chemistry,” Anal. Chim. Acta 589(1), 84–88 (2007). [CrossRef] [PubMed]
G. M. Atkinson, F. P. Stratton, R. L. Kubena, and J. C. Wolfe, “30 nm resolution zero proximity lithography on high-Z substrates,” J. Vac. Sci. Technol. B 10(6), 3104–3108 (1992). [CrossRef]
T. A. Savas, M. L. Schattenburg, J. M. Carter, and I. Henry, “Smith, “Large-area achromatic interferometric lithography for 100 nm period gratings and grids,” J. Vac. Sci. Technol. B 14(6), 4167–4170 (1996). [CrossRef]
T. Sandstrom, A. Bleeker, J. Hintersteiner, K. Troost, J. Freyer, and K. van der Mast, “OML: optical maskless lithography for economic design prototyping and small-volume production,” Proc. SPIE 5377, 777 (2004). [CrossRef]
N. Choksi, D. S. Pickard, M. McCord, R. F. W. Pease, Y. Shroff, Y. Chen, W. Oldham, and D. Markle, “Maskless extreme ultraviolet lithography,” J. Vac. Sci. Technol. B 17(6), 3047–3051 (1999). [CrossRef]
D. Gil, R. Menon, and H. I. Smith, “The case for diffractive optics in maskless lithography,” J. Vac. Sci. Technol. B 21(6), 2810–2814 (2003). [CrossRef]
X. Sun, D. Yin, H. Dai, J. Liu, R. Lu, and S. T. Wu, “Intermittent curing and its effect on pulsed laser-induced photopolymerization,” Appl. Phys. B 92(1), 93–98 (2008). [CrossRef]
H. Xu, J. Zhang, K. M. Davitt, Y.-K. Song, and A. V. Nurmikko, “Applications of blue-green and ultraviolet micro-LEDs to biological imaging and detection,” J. Phys. D Appl. Phys. 41(9), 094013 (2008). [CrossRef]

Aksyuk, V.
Amjadi, M.
Atkinson, G. M.
Basavanhally, N.
Bleeker, A.
Bolle, C. A.
Bower, J. E.
Breadmore, M. C.
Carrilho, E.
Carter, J. M.
Chen, Y.
Choksi, N.
Cirelli, R. A.
Coltro, W. K. T.
Dai, H.
Davitt, K. M.
Dawson, M. D.
Fetter, L.
Fodor, S. P. A.
Fracassi da Silva, J. A.
Freyer, J.
Fullowan, R.
Gil, D.
Girkin, J. M.
Glennon, J. D.
Gong, Z.
Griffin, C.
Gu, E.
Guijt, R. M.
Guilhabert, B.
Hell, S.
Henderson, R. K.
Henry, I.
Hintersteiner, J.
Hunklinger, S.
Jeon, C. W.
Jessop, P. E.
Klemens, F.
Kornblit, A.
Kubena, R. L.
Lee, J.
Liu, J.
Lopez, D. O.
Low, Y. L.
Lu, A. T.
Lu, R.
Lucio do Lago, C.
Mai, T.
Mansfield, W. M.
Markle, D.
Massoubre, D.
McCord, M.
McKendry, J.
Menon, R.
Michel, W.
Miner, J.
Muir, K. R.
Murrihy, J. P.
Naiser, T.
Nurmikko, A. V.
Oldham, W.
O'Mathuna, C.
Ott, A.
Papazian, A. R.
Pardo, F.
Peabody, M.
Pease, R. F. W.
Piccin, E.
Pickard, D. S.
Pirrung, M. C.
Rae, B. R.
Read, J. L.
Rensch, C.
Renshaw, D.
Rodgers, K.
Safi-Shalamzari, M.
Sandstrom, T.
Savas, T. A.
Schattenburg, M. L.
Schickfus, M.
Shroff, Y.
Simon, M. E.
Smith, H. I.
Solas, D.
Song, Y.-K.
Sorouraddin, M. H.
Sorsch, T.
Stratton, F. P.
Stryer, L.
Sun, X.
Tan, A.
Tennant, D. M.
Troost, K.
van der Mast, K.
Watson, G. P.
Weiner, J. S.
Wolfe, J. C.
Wu, S. T.
Xu, H.
Yin, D.
Zhang, H. X.
Zhang, J.

Anal. Chim. Acta

M. H. Sorouraddin, M. Amjadi, and M. Safi-Shalamzari, “Simple and rapid methods for the fabrication of polymeric and glass chips for using in analytical chemistry,” Anal. Chim. Acta 589(1), 84–88 (2007). [CrossRef] [PubMed]

Appl. Opt.

C. Rensch, S. Hell, M. Schickfus, and S. Hunklinger, “Laser scanner for direct writing lithography,” Appl. Opt. 28(17), 3754 (1989). [CrossRef] [PubMed]

Appl. Phys. B

X. Sun, D. Yin, H. Dai, J. Liu, R. Lu, and S. T. Wu, “Intermittent curing and its effect on pulsed laser-induced photopolymerization,” Appl. Phys. B 92(1), 93–98 (2008). [CrossRef]

Appl. Phys. Lett.

C. W. Jeon, E. Gu, and M. D. Dawson, “Mask-free photolithographic exposure using a matrix-addressable micropixellated AlInGaN ultraviolet light-emitting diode,” Appl. Phys. Lett. 86(22), 221105 (2005). [CrossRef]

IEEE Photon. Technol. Lett.

J. McKendry, B. R. Rae, Z. Gong, K. R. Muir, B. Guilhabert, D. Massoubre, E. Gu, D. Renshaw, M. D. Dawson, and R. K. Henderson, “Individually-Addressable AlInGaN Micro-LED Arrays with CMOS Control and Sub-Nanosecond Output Pulses,” IEEE Photon. Technol. Lett. 21(12), 811–813 (2009). [CrossRef]

J. Phys. D Appl. Phys.

H. Xu, J. Zhang, K. M. Davitt, Y.-K. Song, and A. V. Nurmikko, “Applications of blue-green and ultraviolet micro-LEDs to biological imaging and detection,” J. Phys. D Appl. Phys. 41(9), 094013 (2008). [CrossRef]

J. Vac. Sci. Technol. B

N. Choksi, D. S. Pickard, M. McCord, R. F. W. Pease, Y. Shroff, Y. Chen, W. Oldham, and D. Markle, “Maskless extreme ultraviolet lithography,” J. Vac. Sci. Technol. B 17(6), 3047–3051 (1999). [CrossRef]
D. Gil, R. Menon, and H. I. Smith, “The case for diffractive optics in maskless lithography,” J. Vac. Sci. Technol. B 21(6), 2810–2814 (2003). [CrossRef]
G. M. Atkinson, F. P. Stratton, R. L. Kubena, and J. C. Wolfe, “30 nm resolution zero proximity lithography on high-Z substrates,” J. Vac. Sci. Technol. B 10(6), 3104–3108 (1992). [CrossRef]
T. A. Savas, M. L. Schattenburg, J. M. Carter, and I. Henry, “Smith, “Large-area achromatic interferometric lithography for 100 nm period gratings and grids,” J. Vac. Sci. Technol. B 14(6), 4167–4170 (1996). [CrossRef]
G. P. Watson, V. Aksyuk, M. E. Simon, D. M. Tennant, R. A. Cirelli, W. M. Mansfield, F. Pardo, D. O. Lopez, C. A. Bolle, A. R. Papazian, N. Basavanhally, J. Lee, R. Fullowan, F. Klemens, J. Miner, A. Kornblit, T. Sorsch, L. Fetter, M. Peabody, J. E. Bower, J. S. Weiner, and Y. L. Low, “Spatial light modulator for maskless optical projection lithography,” J. Vac. Sci. Technol. B 24(6), 2852 (2006). [CrossRef]

Lab Chip

R. M. Guijt and M. C. Breadmore, “Maskless photolithography using UV LEDs,” Lab Chip 8(8), 1402–1404 (2008). [CrossRef] [PubMed]
A. Tan, K. Rodgers, J. P. Murrihy, C. O'Mathuna, and J. D. Glennon, “Rapid fabrication of microfluidic devices in poly(dimethylsiloxane) by photocopyingPresented at the 14th International Symposium on Microscale Separations and Analysis, Boston, January 13-18, 2001,” Lab Chip 1(1), 7 (2001). [CrossRef] [PubMed]
W. K. T. Coltro, E. Piccin, J. A. Fracassi da Silva, C. Lucio do Lago, and E. Carrilho, “A toner-mediated lithographic technology for rapid prototyping of glass microchannels,” Lab Chip 7(7), 931–934 (2007). [CrossRef] [PubMed]

Opt. Express

H. X. Zhang, D. Massoubre, J. McKendry, Z. Gong, B. Guilhabert, C. Griffin, E. Gu, P. E. Jessop, J. M. Girkin, and M. D. Dawson, “Individually-addressable flip-chip AlInGaN micropixelated light emitting diode arrays with high continuous and nanosecond output power,” Opt. Express 16(13), 9918–9926 (2008). [CrossRef] [PubMed]

Proc. SPIE

T. Sandstrom, A. Bleeker, J. Hintersteiner, K. Troost, J. Freyer, and K. van der Mast, “OML: optical maskless lithography for economic design prototyping and small-volume production,” Proc. SPIE 5377, 777 (2004). [CrossRef]

Rev. Sci. Instrum.

T. Naiser, T. Mai, W. Michel, and A. Ott, “Versatile maskless microscope projection photolithography system and its application in light-directed fabrication of DNA microarrays,” Rev. Sci. Instrum. 77(6), 063711 (2006). [CrossRef]

Science

S. P. A. Fodor, J. L. Read, M. C. Pirrung, L. Stryer, A. T. Lu, and D. Solas, “Light-directed, spatially addressable parallel chemical synthesis,” Science 251(4995), 767–773 (1991). [CrossRef] [PubMed]

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