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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 26 — Dec. 21, 2009
  • pp: 23690–23701

Level-set-based inverse lithography for photomask synthesis

Yijiang Shen, Ngai Wong, and Edmund Y. Lam  »View Author Affiliations


Optics Express, Vol. 17, Issue 26, pp. 23690-23701 (2009)
http://dx.doi.org/10.1364/OE.17.023690


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Abstract

Inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem. We show how the inverse lithography problem can be addressed as an obstacle reconstruction problem or an extended nonlinear image restoration problem, and then solved by a level set time-dependent model with finite difference schemes. We present explicit detailed formulation of the problem together with the first-order temporal and second-order spatial accurate discretization scheme. Experimental results show the superiority of the proposed level set-based ILT over the mainstream gradient methods.

© 2009 Optical Society of America

OCIS Codes
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography
(110.1758) Imaging systems : Computational imaging

ToC Category:
Imaging Systems

History
Original Manuscript: October 30, 2009
Revised Manuscript: December 4, 2009
Manuscript Accepted: December 4, 2009
Published: December 10, 2009

Citation
Yijiang Shen, Ngai Wong, and Edmund Y. Lam, "Level-set-based inverse lithography for photomask synthesis," Opt. Express 17, 23690-23701 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-26-23690


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References

  1. A. K.-K. Wong, Resolution Enhancement Techniques in Optical Lithography (SPIE Press, Bellingham, WA, 2001).
  2. F. Schellenberg, "Resolution enhancement technology: the past, the present, and extensions for the future," Proc. SPIE 5377, 1-20 (2004). [CrossRef]

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