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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 3 — Feb. 2, 2009
  • pp: 1854–1858

Ronchigram quantification via a non-complementary dark-space effect

Sukmock Lee and Jose Sasian  »View Author Affiliations


Optics Express, Vol. 17, Issue 3, pp. 1854-1858 (2009)
http://dx.doi.org/10.1364/OE.17.001854


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Abstract

We observe a non-complementary dark-space produced when two Ronchi-grams, at zero-phase and π -phase, are overlapped and use these dark spaces to quantify Ronchi-grams. Diffraction and multiple beam interference effects narrow the Ronchi fringes created with a coherent point source illumination and prevent accurate determination of the geometrical fringe edges. The dark spaces created when the intensity of two Ronchi grams is added allow assessing the geometrical edge at the dark space middle providing a way to reduce measurement errors. We re-construct the wavefront deformation in a test beam with a 35-term Zernike polynomial. Experimental results are presented.

© 2009 Optical Society of America

OCIS Codes
(120.4800) Instrumentation, measurement, and metrology : Optical standards and testing

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: December 2, 2008
Revised Manuscript: January 12, 2009
Manuscript Accepted: January 23, 2009
Published: January 29, 2009

Citation
Sukmock Lee and Jose Sasian, "Ronchigram quantification via a non-complementary dark-space effect," Opt. Express 17, 1854-1858 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-3-1854


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References

  1. V. Ronchi, "Forty Years of History of a Grating Interferometer," Appl. Opt. 3, 437-451 (1964). [CrossRef]
  2. T. Yatagai, "Fringe scanning Ronchi test for aspherical surfaces," Appl. Opt. 23, 3676-3679 (1984). [CrossRef] [PubMed]
  3. J. Castro-Ramos, and J. Sasian, "Automatic phase shifting Ronchi tester with a square Ronchi ruling," Proc. SPIE 5532, 199-210 (2004). [CrossRef]
  4. There are many different versions, but we adopted one. J. C. Wyant and K. Creath, "Basic Wavefront Aberration Theory for Optical Metrology," in Applied Optics and Optical Engineering, XI, (Academic Press, Inc.1992).
  5. ZEMAX Optical Design Program, ZEMAX Development Corporation, www.zemax.com.

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