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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 4 — Feb. 16, 2009
  • pp: 2623–2630

Low loss high index contrast nanoimprinted polysiloxane waveguides

Ting Han, Steve Madden, Mathew Zhang, Robbie Charters, and Barry Luther-Davies  »View Author Affiliations

Optics Express, Vol. 17, Issue 4, pp. 2623-2630 (2009)

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Nanoimprint lithography is gaining rapid acceptance in fields as diverse as microelectronics and microfluidics due to its simplicity high resolution and low cost. These properties are critically important for the fabrication of photonic devices, where cost is often the major inhibiting deployment factor for high volume applications. We report here on the use of nanoimprint technology to fabricate low loss broadband high index contrast waveguides in a Polysiloxane polymer system for the first time.

© 2009 Optical Society of America

OCIS Codes
(160.5470) Materials : Polymers
(130.5460) Integrated optics : Polymer waveguides

ToC Category:
Integrated Optics

Original Manuscript: December 19, 2008
Revised Manuscript: February 1, 2009
Manuscript Accepted: February 2, 2009
Published: February 9, 2009

Virtual Issues
Vol. 4, Iss. 4 Virtual Journal for Biomedical Optics

Ting Han, Steve Madden, Mathew Zhang, Robbie Charters, and Barry Luther-Davies, "Low loss high index contrast nanoimprinted polysiloxane waveguides," Opt. Express 17, 2623-2630 (2009)

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