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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 5 — Mar. 2, 2009
  • pp: 3531–3542

Dynamic ultrafast laser spatial tailoring for parallel micromachining of photonic devices in transparent materials

C. Mauclair, G. Cheng, N. Huot, E. Audouard, A. Rosenfeld, I. V. Hertel, and R. Stoian  »View Author Affiliations


Optics Express, Vol. 17, Issue 5, pp. 3531-3542 (2009)
http://dx.doi.org/10.1364/OE.17.003531


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Abstract

Femtosecond laser processing of bulk transparent materials can generate localized positive changes of the refractive index. Thus, by translation of the laser spot, light-guiding structures are achievable in three dimensions. Increasing the number of laser processing spots can consequently reduce the machining effort. In this paper, we report on a procedure of dynamic ultrafast laser beam spatial tailoring for parallel photoinscription of photonic functions. Multispot operation is achieved by spatially modulating the wavefront of the beam with a time-evolutive periodical binary phase mask. The parallel longitudinal writing of multiple waveguides is demonstrated in fused silica. Using this technique, light dividers in three dimensions and wavelength-division demultiplexing (WDD) devices relying on evanescent wave coupling are demonstrated.

© 2009 Optical Society of America

OCIS Codes
(010.1080) Atmospheric and oceanic optics : Active or adaptive optics
(140.3390) Lasers and laser optics : Laser materials processing
(230.7370) Optical devices : Waveguides

ToC Category:
Laser Micromachining

History
Original Manuscript: December 1, 2008
Revised Manuscript: January 12, 2009
Manuscript Accepted: January 13, 2009
Published: February 23, 2009

Citation
C. Mauclair, G. Cheng, N. Huot, E. Audouard, A. Rosenfeld, I. V. Hertel, and R. Stoian, "Dynamic ultrafast laser spatial tailoring for parallel micromachining of photonic devices in transparent materials," Opt. Express 17, 3531-3542 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-5-3531


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