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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 6 — Mar. 16, 2009
  • pp: 4419–4426

Pitch-variable blazed grating consisting of freestanding silicon beams

Yongjin Wang, Yoshiaki Kanamori, and Kazuhiro Hane  »View Author Affiliations

Optics Express, Vol. 17, Issue 6, pp. 4419-4426 (2009)

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Theoretical analysis is presented for a pitch-variable blazed grating which consists of freestanding silicon beams. The pitch-variable blazed grating is implemented by combining silicon-on-insulator (SOI) technology with microelectronicmechanical system (MEMS) technology. The whole device is fabricated on a 10μm silicon device layer to guarantee sufficient stiffness. The 4-level blazed surface profile is realized by combining a two-mask process with fast atom beam etching. Electrostatic combdrive microactuators with double folded springs are proposed to stretch the freestanding grating beams. In association with reactive ion etching and vapor HF release, the freestanding grating beams and the microactuators are obtained, and a Cr/Au film is deposited onto the blazed grating surfaces by a protective mask process to improve the diffracted power. Mechanical response and diffraction efficiency of fabricated devices are characterized, and the experimental results indicate that the fabricated 4-level blazed gratings extend both the tuning range and the diffraction efficiency of the 1st diffraction order of present MEMS diffraction gratings.

© 2009 Optical Society of America

OCIS Codes
(260.5740) Physical optics : Resonance
(220.4241) Optical design and fabrication : Nanostructure fabrication
(230.5298) Optical devices : Photonic crystals

ToC Category:
Optical Design and Fabrication

Original Manuscript: January 6, 2009
Revised Manuscript: February 20, 2009
Manuscript Accepted: February 26, 2009
Published: March 4, 2009

Yongjin Wang, Yoshiaki Kanamori, and Kazuhiro Hane, "Pitch-variable blazed grating consisting of freestanding silicon beams," Opt. Express 17, 4419-4426 (2009)

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