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Optics Express

Optics Express

  • Vol. 17, Iss. 7 — Mar. 30, 2009
  • pp: 4938–4943

Fabrication and characterization of nanoscale resonant gratings on thin silicon membrane

Yongjin Wang, Yoshiaki Kanamori, Jiasheng Ye, Hidehisa Sameshima, and Kazuhiro Hane  »View Author Affiliations


Optics Express, Vol. 17, Issue 7, pp. 4938-4943 (2009)
http://dx.doi.org/10.1364/OE.17.004938


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Abstract

We report the design and fabrication of nanoscale resonant gratings which is of interest for narrow bandwidth filtering application. The linear/circular grating structures, of which the grating width is 200nm and the grating height is 260nm, are generated on silicon-on-insulator wafer. Nanoscale gratings are fabricated on the silicon device layer by a combination of electron beam lithography and fast atom beam etching. The silicon handle layer under grating region is removed by deep reactive ion etching, and the buried oxide layer is kept. The reflectance measurements are performed to characterize the optical response of fabricated freestanding nanoscale gratings. The resonant behavior of linear gratings agrees with the theoretical predication, and the polarization-independent responses of circular gratings are also experimentally demonstrated.

© 2009 Optical Society of America

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(160.4670) Materials : Optical materials
(220.4241) Optical design and fabrication : Nanostructure fabrication

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: October 28, 2008
Revised Manuscript: January 21, 2009
Manuscript Accepted: March 12, 2009
Published: March 16, 2009

Citation
Yongjin Wang, Yoshiaki Kanamori, Jiasheng Ye, Hidehisa Sameshima, and Kazuhiro Hane, "Fabrication and characterization of nanoscale resonant gratings on thin silicon membrane," Opt. Express 17, 4938-4943 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-7-4938


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