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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 10 — May. 10, 2010
  • pp: 10369–10376

Aspects for calculating local absorption with the rigorous coupled-wave method

Karl-Heinz Brenner  »View Author Affiliations

Optics Express, Vol. 18, Issue 10, pp. 10369-10376 (2010)

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The calculation of local absorption is very important in the context of lithography and in photo-detector design. We present a rigorous method for calculating the local absorption in periodic structures. The computation depends primarily on the calculation of the electric field inside the structure. Since the standard definitions produce unsatisfactory results, we use a modified version of a method published by Lalanne [J. Modern Opt. 45, 1357 (1998)]. The results for these field definitions agree very accurately with results obtained by the law of conservation of energy. We present some examples which are typical for the application scenarios of lithography and detectors.

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OCIS Codes
(050.1960) Diffraction and gratings : Diffraction theory
(260.2110) Physical optics : Electromagnetic optics
(260.2160) Physical optics : Energy transfer
(050.1755) Diffraction and gratings : Computational electromagnetic methods

ToC Category:
Physical Optics

Original Manuscript: March 19, 2010
Revised Manuscript: April 15, 2010
Manuscript Accepted: April 15, 2010
Published: May 4, 2010

Karl-Heinz Brenner, "Aspects for calculating local absorption 
with the rigorous coupled-wave method," Opt. Express 18, 10369-10376 (2010)

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  1. N. Moll, T. Morf, M. Fertig, T. Stoferle, B. Trauter, R. F. Mahrt, J. Weiss, T. Pfluger, and K.-H. Brenner, “Polarization-Independent Photodetectors With Enhanced Responsivity in a Standard Silicon-on-Insulator Complementary Metal–Oxide–Semiconductor Process,” J. Lightwave Technol. 27(21), 4892–4896 (2009). [CrossRef]
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