Monochromatic aberrations in resonant optical elements applied to a focusing multilevel reflectarray
Optics Express, Vol. 18, Issue 11, pp. 10931-10940 (2010)
http://dx.doi.org/10.1364/OE.18.010931
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Abstract
The monochromatic aberrations produced by the phase distribution reflected by resonant sub-wavelength metallic structures are studied both analytically and numerically. Even for normal incidence, the angular dependence of the re-radiated wavefront disturbs the overall performance of the reflectarray. This effect is modelled as combination of a linear and a cubic dependence. A complete numerical simulation of a multilevel focusing reflectarray is performed using computational-electromagnetic and physical-optics-propagation methods. A modified Strehl ratio is defined to show the dependence of the focused spot behavior on aperture. The irradiance distribution is dependent on the polarization state. A small-aperture focusing reflectarray has been designed, fabricated, and tested. The irradiance distribution at the focusing plane is compared with the simulated one, showing a good agreement when residual wavefront aberrations are included.
© 2010 OSA
ToC Category:
Metamaterials
History
Original Manuscript: February 11, 2010
Revised Manuscript: April 3, 2010
Manuscript Accepted: April 5, 2010
Published: May 10, 2010
Citation
James Ginn, Javier Alda, José Antonio Gómez-Pedrero, and Glenn Boreman, "Monochromatic aberrations in resonant optical elements applied to a focusing multilevel reflectarray," Opt. Express 18, 10931-10940 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-11-10931
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