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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 11 — May. 24, 2010
  • pp: 11754–11762

A versatile diffractive maskless lithography for single-shot and serial microfabrication

Nathan J. Jenness, Ryan T. Hill, Angus Hucknall, Ashutosh Chilkoti, and Robert L. Clark  »View Author Affiliations

Optics Express, Vol. 18, Issue 11, pp. 11754-11762 (2010)

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We demonstrate a diffractive maskless lithographic system that is capable of rapidly performing both serial and single-shot micropatterning. Utilizing the diffractive properties of phase holograms displayed on a spatial light modulator, arbitrary intensity distributions were produced to form two and three dimensional micropatterns/structures in a variety of substrates. A straightforward graphical user interface was implemented to allow users to load templates and change patterning modes within the span of a few minutes. A minimum resolution of ~700 nm is demonstrated for both patterning modes, which compares favorably to the 232 nm resolution limit predicted by the Rayleigh criterion. The presented method is rapid and adaptable, allowing for the parallel fabrication of microstructures in photoresist as well as the fabrication of protein microstructures that retain functional activity.

© 2010 OSA

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(230.6120) Optical devices : Spatial light modulators
(350.3450) Other areas of optics : Laser-induced chemistry
(050.6875) Diffraction and gratings : Three-dimensional fabrication

ToC Category:
Laser Microfabrication

Original Manuscript: March 2, 2010
Revised Manuscript: April 30, 2010
Manuscript Accepted: April 30, 2010
Published: May 19, 2010

Nathan J. Jenness, Ryan T. Hill, Angus Hucknall, Ashutosh Chilkoti, and Robert L. Clark, "A versatile diffractive maskless lithography for single-shot and serial microfabrication," Opt. Express 18, 11754-11762 (2010)

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