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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 15 — Jul. 19, 2010
  • pp: 15975–15980

A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique

Mingyang He, Zhiyou Zhang, Sha Shi, Jinglei Du, Xupeng Li, Shuhong Li, and Wenying Ma  »View Author Affiliations


Optics Express, Vol. 18, Issue 15, pp. 15975-15980 (2010)
http://dx.doi.org/10.1364/OE.18.015975


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Abstract

For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside -exposure method are studied and the interference fringes with feature size below 65nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid.

© 2010 OSA

OCIS Codes
(220.3740) Optical design and fabrication : Lithography
(240.6680) Optics at surfaces : Surface plasmons
(310.6628) Thin films : Subwavelength structures, nanostructures

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: June 1, 2010
Revised Manuscript: June 28, 2010
Manuscript Accepted: June 29, 2010
Published: July 13, 2010

Citation
Mingyang He, Zhiyou Zhang, Sha Shi, Jinglei Du, Xupeng Li, Shuhong Li, and Wenying Ma, "A practical nanofabrication method: surface plasmon polaritons interference lithography based on backside-exposure technique," Opt. Express 18, 15975-15980 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-15-15975


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