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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 16 — Aug. 2, 2010
  • pp: 16387–16405

Diffractive phase-shift lithography photomask operating in proximity printing mode

Giuseppe A. Cirino, Ronaldo D. Mansano, Patrick Verdonck, Lucila Cescato, and Luiz G. Neto  »View Author Affiliations

Optics Express, Vol. 18, Issue 16, pp. 16387-16405 (2010)

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A phase shift proximity printing lithographic mask is designed, manufactured and tested. Its design is based on a Fresnel computer-generated hologram, employing the scalar diffraction theory. The obtained amplitude and phase distributions were mapped into discrete levels. In addition, a coding scheme using sub-cells structure was employed in order to increase the number of discrete levels, thus increasing the degree of freedom in the resulting mask. The mask is fabricated on a fused silica substrate and an amorphous hydrogenated carbon (a:C-H) thin film which act as amplitude modulation agent. The lithographic image is projected onto a resist coated silicon wafer, placed at a distance of 50 μm behind the mask. The results show a improvement of the achieved resolution – linewidth as good as 1.5 μm - what is impossible to obtain with traditional binary masks in proximity printing mode. Such achieved dimensions can be used in the fabrication of MEMS and MOEMS devices. These results are obtained with a UV laser but also with a small arc lamp light source exploring the partial coherence of this source.

© 2010 OSA

OCIS Codes
(110.5220) Imaging systems : Photolithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(150.1135) Machine vision : Algorithms
(310.6845) Thin films : Thin film devices and applications
(070.7345) Fourier optics and signal processing : Wave propagation

ToC Category:
Imaging Systems

Original Manuscript: June 17, 2010
Revised Manuscript: July 6, 2010
Manuscript Accepted: July 7, 2010
Published: July 20, 2010

Giuseppe A. Cirino, Ronaldo D. Mansano, Patrick Verdonck, Lucila Cescato, and Luiz G. Neto, "Diffractive phase-shift lithography photomask operating in proximity printing mode," Opt. Express 18, 16387-16405 (2010)

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