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High-aspect ratio nanochannel formation by single femtosecond laser pulses |
Optics Express, Vol. 18, Issue 16, pp. 16840-16848 (2010)
http://dx.doi.org/10.1364/OE.18.016840
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Abstract
Single femtosecond pulsed laser damage can be confined radially to regions smaller than the focus spot size due to the highly nonlinear mechanisms for energy absorption and ablation in transparent dielectrics. Along the propagation axis, however, we show that channels can be machined much deeper than the Rayleigh range of the laser focus. Using focused ion beam cross sections and acetate imprints, we analyze these channels and show that spherical aberration is not the primary source for this elongated damage, which is likely caused by microscale filamentation.
© 2010 OSA
OCIS Codes
(260.5950) Physical optics : Self-focusing
(320.2250) Ultrafast optics : Femtosecond phenomena
(320.7110) Ultrafast optics : Ultrafast nonlinear optics
(350.3390) Other areas of optics : Laser materials processing
(220.4241) Optical design and fabrication : Nanostructure fabrication
ToC Category:
Laser Microfabrication
History
Original Manuscript: July 1, 2010
Manuscript Accepted: July 13, 2010
Published: July 23, 2010
Citation
Jeffrey F. Herbstman and Alan J. Hunt, "High-aspect ratio nanochannel formation by single femtosecond laser pulses," Opt. Express 18, 16840-16848 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-16-16840
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