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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 19 — Sep. 13, 2010
  • pp: 19485–19494

Advanced mask aligner lithography: Fabrication of periodic patterns using pinhole array mask and Talbot effect

Lorenz Stuerzebecher, Torsten Harzendorf, Uwe Vogler, Uwe D. Zeitner, and Reinhard Voelkel  »View Author Affiliations

Optics Express, Vol. 18, Issue 19, pp. 19485-19494 (2010)

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The Talbot effect is utilized for micro-fabrication of periodic microstructures via proximity lithography in a mask aligner. A novel illumination system, referred to as MO Exposure Optics, allows to control the effective source shape and accordingly the angular spectrum of the illumination light. Pinhole array photomasks are employed to generate periodic high-resolution diffraction patterns by means of self-imaging. They create a demagnified image of the effective source geometry in their diffraction pattern which is printed to photoresist. The proposed method comprises high flexibility and sub-micron resolution at large proximity gaps. Various periodic structures have been generated and are presented.

© 2010 OSA

OCIS Codes
(050.1940) Diffraction and gratings : Diffraction
(070.6760) Fourier optics and signal processing : Talbot and self-imaging effects
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication

ToC Category:
Optical Design and Fabrication

Original Manuscript: June 22, 2010
Revised Manuscript: August 20, 2010
Manuscript Accepted: August 20, 2010
Published: August 30, 2010

Lorenz Stuerzebecher, Torsten Harzendorf, Uwe Vogler, Uwe D. Zeitner, and Reinhard Voelkel, "Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect," Opt. Express 18, 19485-19494 (2010)

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