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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 19 — Sep. 13, 2010
  • pp: 20019–20028

Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light

Min-Hui Hu, Karine Le Guen, Jean-Michel André, Philippe Jonnard, Evgueni Meltchakov, Franck Delmotte, and Anouk Galtayries  »View Author Affiliations


Optics Express, Vol. 18, Issue 19, pp. 20019-20028 (2010)
http://dx.doi.org/10.1364/OE.18.020019


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Abstract

We present the results of an optical and chemical, depth and surface study of Al/Mo/SiC periodic multilayers, designed as high reflectivity coatings for the extreme ultra-violet (EUV) range. In comparison to the previously studied Al/SiC system, the introduction of Mo as a third material in the multilayer structure allows us to decrease In comparison to the previously studied Al/SiC system with a reflectance of 37% at near normal incidence around 17 nm, the introduction of Mo as a third material in the multilayer structure allows us to decrease the interfacial roughness and achieve an EUV reflectivity of 53.4%, measured with synchrotron radiation. This is the first report of a reflectivity higher than 50% around 17 nm. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) and x-ray photoelectron spectroscopy (XPS) measurements are performed on the Al/Mo/SiC system in order to analyze the individual layers within the stack. ToF-SIMS and XPS results give evidence that the first SiC layer is partially oxidized, but the O atoms do not reach the first Mo and Al layers. We use these results to properly describe the multilayer stack and discuss the possible reasons for the difference between the measured and simulated EUV reflectivity values.

© 2010 OSA

OCIS Codes
(230.1480) Optical devices : Bragg reflectors
(230.4170) Optical devices : Multilayers
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)
(240.6675) Optics at surfaces : Surface photoemission and photoelectron spectroscopy

ToC Category:
X-ray Optics

History
Original Manuscript: July 19, 2010
Revised Manuscript: August 26, 2010
Manuscript Accepted: August 26, 2010
Published: September 3, 2010

Citation
Min-Hui Hu, Karine Le Guen, Jean-Michel André, Philippe Jonnard, Evgueni Meltchakov, Franck Delmotte, and Anouk Galtayries, "Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light," Opt. Express 18, 20019-20028 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-19-20019


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