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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 2 — Jan. 18, 2010
  • pp: 1734–1740

Improvement of linewidth in laser beam lithographed computer generated hologram

Hyug-Gyo Rhee and Yun-Woo Lee  »View Author Affiliations

Optics Express, Vol. 18, Issue 2, pp. 1734-1740 (2010)

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We propose a new laser lithographic technique with enhanced resolution. A calcite wave plate is introduced in our system to separate an input lithographic beam into two orthogonally polarized beams. After going through an imaging lens, these two beams meet again on the focal point, and generate a small interferogram that sharpens the shape of the focused beam spot. Using this phenomenon, we can overcome the diffraction limit of the imaging lens and achieve a 486-nm-linewidth.

© 2010 OSA

OCIS Codes
(120.4610) Instrumentation, measurement, and metrology : Optical fabrication

ToC Category:
Optical Design and Fabrication

Original Manuscript: December 11, 2009
Revised Manuscript: January 7, 2010
Manuscript Accepted: January 8, 2010
Published: January 14, 2010

Hyug-Gyo Rhee and Yun-Woo Lee, "Improvement of linewidth in laser beam lithographed computer generated hologram," Opt. Express 18, 1734-1740 (2010)

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