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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 2 — Jan. 18, 2010
  • pp: 700–712

Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure

A.R. Khorsand, R. Sobierajski, E. Louis, S. Bruijn, E.D. van Hattum, R.W.E. van de Kruijs, M. Jurek, D. Klinger, J.B. Pelka, L. Juha, T. Burian, J. Chalupsky, J. Cihelka, V. Hajkova, L. Vysin, U. Jastrow, N. Stojanovic, S. Toleikis, H. Wabnitz, K. Tiedtke, K. Sokolowski-Tinten, U. Shymanovich, J. Krzywinski, S. Hau-Riege, R. London, A. Gleeson, E.M. Gullikson, and F. Bijkerk  »View Author Affiliations


Optics Express, Vol. 18, Issue 2, pp. 700-712 (2010)
http://dx.doi.org/10.1364/OE.18.000700


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Abstract

We investigated single shot damage of Mo/Si multilayer coatings exposed to the intense fs XUV radiation at the Free-electron LASer facility in Hamburg - FLASH. The interaction process was studied in situ by XUV reflectometry, time resolved optical microscopy, and “post-mortem” by interference-polarizing optical microscopy (with Nomarski contrast), atomic force microscopy, and scanning transmission electron microcopy. An ultrafast molybdenum silicide formation due to enhanced atomic diffusion in melted silicon has been determined to be the key process in the damage mechanism. The influence of the energy diffusion on the damage process was estimated. The results are of significance for the design of multilayer optics for a new generation of pulsed (from atto- to nanosecond) XUV sources.

© 2010 OSA

OCIS Codes
(140.2600) Lasers and laser optics : Free-electron lasers (FELs)
(140.3330) Lasers and laser optics : Laser damage
(140.6810) Lasers and laser optics : Thermal effects
(220.0220) Optical design and fabrication : Optical design and fabrication
(230.4170) Optical devices : Multilayers

ToC Category:
Lasers and Laser Optics

History
Original Manuscript: December 1, 2009
Manuscript Accepted: December 16, 2009
Published: January 5, 2010

Citation
A. R. Khorsand, R. Sobierajski, E. Louis, S. Bruijn, E. D. van Hattum, R. W. E. van de Kruijs, M. Jurek, D. Klinger, J. B. Pelka, L. Juha, T. Burian, J. Chalupsky, J. Cihelka, V. Hajkova, L. Vysin, U. Jastrow, N. Stojanovic, S. Toleikis, H. Wabnitz, K. Tiedtke, K. Sokolowski-Tinten, U. Shymanovich, J. Krzywinski, S. Hau-Riege, R. London, A. Gleeson, E. M. Gullikson, and F. Bijkerk, "Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure," Opt. Express 18, 700-712 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-2-700


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