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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 20 — Sep. 27, 2010
  • pp: 20968–20978

Advanced mask aligner lithography: new illumination system

Reinhard Voelkel, Uwe Vogler, Andreas Bich, Pascal Pernet, Kenneth J. Weible, Michael Hornung, Ralph Zoberbier, Elmar Cullmann, Lorenz Stuerzebecher, Torsten Harzendorf, and Uwe D. Zeitner  »View Author Affiliations


Optics Express, Vol. 18, Issue 20, pp. 20968-20978 (2010)
http://dx.doi.org/10.1364/OE.18.020968


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Abstract

A new illumination system for mask aligner lithography is presented. The illumination system uses two subsequent microlens-based Köhler integrators. The second Köhler integrator is located in the Fourier plane of the first. The new illumination system uncouples the illumination light from the light source and provides excellent uniformity of the light irradiance and the angular spectrum. Spatial filtering allows to freely shape the angular spectrum to minimize diffraction effects in contact and proximity lithography. Telecentric illumination and ability to precisely control the illumination light allows to introduce resolution enhancement technologies (RET) like customized illumination, optical proximity correction (OPC) and source-mask optimization (SMO) in mask aligner lithography.

© 2010 OSA

OCIS Codes
(050.1940) Diffraction and gratings : Diffraction
(110.3960) Imaging systems : Microlithography
(110.5220) Imaging systems : Photolithography
(220.3740) Optical design and fabrication : Lithography
(350.3950) Other areas of optics : Micro-optics
(220.2945) Optical design and fabrication : Illumination design

ToC Category:
Optical Design and Fabrication

History
Original Manuscript: August 11, 2010
Revised Manuscript: September 12, 2010
Manuscript Accepted: September 13, 2010
Published: September 17, 2010

Citation
Reinhard Voelkel, Uwe Vogler, Andreas Bich, Pascal Pernet, Kenneth J. Weible, Michael Hornung, Ralph Zoberbier, Elmar Cullmann, Lorenz Stuerzebecher, Torsten Harzendorf, and Uwe D. Zeitner, "Advanced mask aligner lithography: new illumination system," Opt. Express 18, 20968-20978 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-20-20968


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References

  1. R. Voelkel, U. Vogler, A. Bich, K. J. Weible, M. Eisner, M. Hornung, P. Kaiser, R. Zoberbier, E. Cullmann, „Illumination system for a microlithographic contact and proximity exposure apparatus“, EP 09169158.4, (2009).
  2. U. Vogler, “Optimierung des Beleuchtungssystems für Proximitylithographie in Mask Alignern”, Diploma Thesis, Technische Universität Ilmenau, (2009).
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  20. L. Stuerzebecher, T. Harzendorf, U. Vogler, U. Zeitner, and R. Voelkel, “Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect,” Opt. Express 18(19), 19485–19494 (2010). [CrossRef] [PubMed]

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