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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 20 — Sep. 27, 2010
  • pp: 21090–21099

Parallel direct laser writing in three dimensions with spatially dependent aberration correction

Alexander Jesacher and Martin J. Booth  »View Author Affiliations


Optics Express, Vol. 18, Issue 20, pp. 21090-21099 (2010)
http://dx.doi.org/10.1364/OE.18.021090


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Abstract

We propose a hologram design process which aims at reducing aberrations in parallel three-dimensional direct laser writing applications. One principle of the approach is to minimise the diffractive power of holograms while retaining the degree of parallelisation. This reduces focal distortion caused by chromatic aberration. We address associated problems such as the zero diffraction order and aberrations induced by a potential refractive index mismatch between the immersion medium of the microscope objective and the fabrication substrate. Results from fabrication in diamond, fused silica and lithium niobate are presented.

© 2010 Optical Society of America

OCIS Codes
(050.1970) Diffraction and gratings : Diffractive optics
(090.1000) Holography : Aberration compensation
(140.3390) Lasers and laser optics : Laser materials processing
(070.6120) Fourier optics and signal processing : Spatial light modulators

ToC Category:
Laser Microfabrication

History
Original Manuscript: August 10, 2010
Revised Manuscript: September 13, 2010
Manuscript Accepted: September 16, 2010
Published: September 21, 2010

Citation
Alexander Jesacher and Martin J. Booth, "Parallel direct laser writing in three dimensions with spatially dependent aberration correction," Opt. Express 18, 21090-21099 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-20-21090


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