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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 20 — Sep. 27, 2010
  • pp: 21410–21418

Fast ellipsometric measurements based on a single crystal photo-elastic modulator

R. Petkovšek, Jaka Petelin, J. Možina, and F. Bammer  »View Author Affiliations

Optics Express, Vol. 18, Issue 20, pp. 21410-21418 (2010)

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For quality control in high volume manufacturing of thin layers and for tracking of physical and chemical processes, ellipsometry is a common measurement technology. For such kinds of applications we present a novel approach of fast ellipsometric measurements. Instead of a conventional setup that uses a standard photo-elastic modulator, we use a 92 kHz Single Crystal Photo-Elastic Modulator (SCPEM), which is a LiTaO3 crystal with a size of 28 × 9 × 4 mm. This small, simple, and cost-effective solution also offers the advantage of direct control of the retardation via the current amplitude, which is important for repeatability of the measurements. Instead of a Lock-In Amplifier, an automated digital processing based on a fast analog to digital converter controlled by a highly flexible Field Programmable Gate Array is used. This and the extremely compact and efficient polarization modulation allow fast ellipsometric testing where the upper limit of measurement rates is mainly limited by the desired accuracy and repeatability of the measurements. The standard deviation that is related to the repeatability +/–0.002° for dielectric layers can be easily reached.

© 2010 OSA

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(230.4110) Optical devices : Modulators
(260.2130) Physical optics : Ellipsometry and polarimetry
(240.2130) Optics at surfaces : Ellipsometry and polarimetry

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: July 28, 2010
Revised Manuscript: September 10, 2010
Manuscript Accepted: September 10, 2010
Published: September 23, 2010

R. Petkovšek, Jaka Petelin, J. Možina, and F. Bammer, "Fast ellipsometric measurements based on a single crystal photo-elastic modulator," Opt. Express 18, 21410-21418 (2010)

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  1. H. G. Tompkins, A Users's Guide to Ellipsometry, Academic Press Inc., London (1993).
  2. B. Drévillon, J. Perrin, R. Marbot, A. Violet, and J. L. Dalby, “Fast polarization modulated ellipsometer using a microprocessor system for digital Fourier analysis,” Rev. Sci. Instrum. 53(7), 969–977 (1982). [CrossRef]
  3. Product bulletin, http://www.hindsinstruments.com/wp-content/uploads/Abrio-Product-Bulletin.pdf
  4. C.-Y. Han and Y.-F. Chao, “Photoelastic modulated imaging ellipsometry by stroboscopic illumination technique,” Rev. Sci. Instrum. 77(2), 023107 (2006). [CrossRef]
  5. M. V. Khazimullin and Y. A. Lebedev, “Fourier transform approach in modulation technique of experimental measurements,” Rev. Sci. Instrum. 81(4), 043110 (2010). [CrossRef] [PubMed]
  6. J. C. Kemp, “Piezo-optical birefringence modulators: new use for a long-known effect,” J. Opt. Soc. Am. 59, 950–954 (1969).
  7. J. C. Canit and J. Badoz, “New design for a photoelastic modulator,” Appl. Opt. 22(4), 592–594 (1983). [CrossRef] [PubMed]
  8. A. Zeng, L. Huang, Z. Dong, J. Hu, H. Huang, and X. Wang, “Calibration method for a photoelastic modulator with a peak retardation of less than a half-wavelength,” Appl. Opt. 46(5), 699–703 (2007). [CrossRef] [PubMed]
  9. F. Bammer, B. Holzinger, and T. Schumi, “A single crystal photo-elastic modulator,” Proc. SPIE 6469, 1–8 (2007).
  10. S.-M. F. Nee, “Error analysis of null ellipsometry with depolarization,” Appl. Opt. 38(25), 5388–5398 (1999). [CrossRef]
  11. H. Zhu, L. Liu, Y. Wen, Z. Lü, and B. Zhang, “High-precision system for automatic null ellipsometric measurement,” Appl. Opt. 41(22), 4536–4540 (2002). [CrossRef] [PubMed]
  12. S. N. Jasperson and S. E. Schnatterly, “An improved method for high reflectivity ellipsometry based on a new polarization modulation technique,” Rev. Sci. Instrum. 40(6), 761–767 (1969). [CrossRef]
  13. R. Petkovsek, F. Bammer, D. Schuöcker, and J. Mozina, “Dual-mode single-crystal photo-elastic modulator and possible applications,” Appl. Opt. 48(7), C86–C91 (2009). [CrossRef] [PubMed]
  14. K. Postava, A. Maziewski, T. Yamaguchi, R. Ossikovski, S. Višnovsky, and J. Pištora, “Null ellipsometer with phase modulation,” Opt. Express 12(24), 6040–6045 (2004), http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-12-24-6040 . [CrossRef] [PubMed]

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