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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 23 — Nov. 8, 2010
  • pp: 23776–23783

Mixed metal dielectric gratings for pulse compression

J. Neauport, N. Bonod, S. Hocquet, S. Palmier, and G. Dupuy  »View Author Affiliations

Optics Express, Vol. 18, Issue 23, pp. 23776-23783 (2010)

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We report on manufacturing and testing results of high efficiency mixed metal dielectric gratings (MMLD) for high power pulse compression applications. The gratings with 1780 l/mm are etched in the top low index layer of a Au-(SiO2/HfO2)4-SiO2 mirror stack. Various grating profiles manufactured in order to modify the near electric field distribution are damage tested on a facility operating at 1.053 µm, 500 fs pulse duration. We evidence that damage threshold is governed by the value of the maximum electric field intensity inside the grating pillar. Moreover thresholds close to 3 J/cm2 beam normal are obtained with this new MMLD grating being thus an interesting alternative to gold and pure dielectric gratings for pulse compression applications.

© 2010 OSA

OCIS Codes
(050.0050) Diffraction and gratings : Diffraction and gratings
(140.7090) Lasers and laser optics : Ultrafast lasers
(350.1820) Other areas of optics : Damage

ToC Category:
Diffraction and Gratings

Original Manuscript: September 8, 2010
Revised Manuscript: October 1, 2010
Manuscript Accepted: October 6, 2010
Published: October 27, 2010

J. Neauport, N. Bonod, S. Hocquet, S. Palmier, and G. Dupuy, "Mixed metal dielectric gratings for pulse compression," Opt. Express 18, 23776-23783 (2010)

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