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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 23 — Nov. 8, 2010
  • pp: 23878–23890

Simulating different manufactured antireflective sub-wavelength structures considering the influence of local topographic variations

Dennis Lehr, Michael Helgert, Michael Sundermann, Christoph Morhard, Claudia Pacholski, Joachim P. Spatz, and Robert Brunner  »View Author Affiliations


Optics Express, Vol. 18, Issue 23, pp. 23878-23890 (2010)
http://dx.doi.org/10.1364/OE.18.023878


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Abstract

Laterally structured antireflective sub-wavelength structures show unique properties with respect to broadband performance, damage threshold and thermal stability. Thus they are superior to classical layer based antireflective coatings for a number of applications. Dependent on the selected fabrication technology the local topography of the periodic structure may deviate from the perfect repetition of a sub-wavelength unit cell. We used rigorous coupled-wave analysis (RCWA) to simulate the efficiency losses due to scattering effects based on height and displacement variations between the individual protuberances. In these simulations we chose conical and Super-Gaussian shapes to approximate the real profile of structures fabricated in fused silica. The simulation results are in accordance with the experimentally determined optical properties of sub-wavelength structures over a broad wavelength range. Especially the transmittance reduction in the deep-UV could be ascribed to these variations in the sub-wavelength structures.

© 2010 Optical Society of America

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(290.0290) Scattering : Scattering
(310.1210) Thin films : Antireflection coatings
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Diffraction and Gratings

History
Original Manuscript: June 30, 2010
Revised Manuscript: July 28, 2010
Manuscript Accepted: July 29, 2010
Published: October 29, 2010

Citation
Dennis Lehr, Michael Helgert, Michael Sundermann, Christoph Morhard, Claudia Pacholski, Joachim P. Spatz, and Robert Brunner, "Simulating different manufactured antireflective sub-wavelength structures considering the influence of local topographic variations," Opt. Express 18, 23878-23890 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-23-23878


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