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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 23 — Nov. 8, 2010
  • pp: 23933–23938

Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser

S. P. Hau-Riege, R. A. London, A. Graf, S. L. Baker, R. Soufli, R. Sobierajski, T. Burian, J. Chalupsky, L. Juha, J. Gaudin, J. Krzywinski, S. Moeller, M. Messerschmidt, J. Bozek, and C. Bostedt  »View Author Affiliations


Optics Express, Vol. 18, Issue 23, pp. 23933-23938 (2010)
http://dx.doi.org/10.1364/OE.18.023933


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Abstract

Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.

© 2010 OSA

OCIS Codes
(160.4670) Materials : Optical materials
(340.0340) X-ray optics : X-ray optics

ToC Category:
X-ray Optics

History
Original Manuscript: August 16, 2010
Manuscript Accepted: October 5, 2010
Published: October 29, 2010

Citation
S. P. Hau-Riege, R. A. London, A. Graf, S. L. Baker, R. Soufli, R. Sobierajski, T. Burian, J. Chalupsky, L. Juha, J. Gaudin, J. Krzywinski, S. Moeller, M. Messerschmidt, J. Bozek, and C. Bostedt, "Interaction of short x-ray pulses 
with low-Z x-ray optics materials 
at the LCLS free-electron laser," Opt. Express 18, 23933-23938 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-23-23933


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