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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 24 — Nov. 22, 2010
  • pp: 24859–24867

Refractive index and dielectric constant evolution of ultra-thin gold from clusters to films

Xuefeng Wang, Kuo-ping Chen, Ming Zhao, and David D. Nolte  »View Author Affiliations


Optics Express, Vol. 18, Issue 24, pp. 24859-24867 (2010)
http://dx.doi.org/10.1364/OE.18.024859


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Abstract

Using high-speed picometrology, the complete cluster-to-film dielectric trajectories of ultra-thin gold films on silica are measured at 488 nm and 532 nm wavelengths for increasing mass-equivalent thickness from 0.2 nm to 10 nm. The trajectories are parametric curves on the complex dielectric plane that consist of three distinct regimes with two turning points. The thinnest regime (0.2 nm – 0.6 nm) exhibits increasing dipole density up to the turning point for the real part of the dielectric function at which the clusters begin to acquire metallic character. The mid-thickness regime (0.6 nm ~2 nm) shows a linear trajectory approaching the turning point for the imaginary part of the dielectric function. The third regime, from 2 nm to 10 nm, clearly displays the Drude circle, with no observable feature at the geometric percolation transition.

© 2010 OSA

OCIS Codes
(120.3940) Instrumentation, measurement, and metrology : Metrology
(240.0240) Optics at surfaces : Optics at surfaces
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Thin Films

History
Original Manuscript: September 28, 2010
Revised Manuscript: October 25, 2010
Manuscript Accepted: October 26, 2010
Published: November 2, 2010

Citation
Xuefeng Wang, Kuo-ping Chen, Ming Zhao, and David D. Nolte, "Refractive index and dielectric constant transition of ultra-thin gold from cluster to Film," Opt. Express 18, 24859-24867 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-24-24859


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