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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 3 — Feb. 1, 2010
  • pp: 1872–1878

Direct patterning of silicon oxide on Si-substrate induced by femtosecond laser

Amirkianoosh Kiani, Krishnan Venkatakrishnan, and Bo Tan  »View Author Affiliations

Optics Express, Vol. 18, Issue 3, pp. 1872-1878 (2010)

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In this study we report for the first time a method for direct patterning of silicon oxide on a silicon substrate by irradiation with a femtosecond laser of Mega Hertz pulse frequency under ambient condition. Embossed lines of silicon oxide with around 3~4 μm width and less than 100 nm height were formed by controlling the parameters such as laser pulse power and frequency rate. A Scanning Electron Microscope (SEM), an optical microscopy and a Micro-Raman and Energy Dispersive X-ray (EDX) spectroscopy were used to analyze the silicon oxide layer.

© 2010 OSA

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(140.6810) Lasers and laser optics : Thermal effects
(160.6000) Materials : Semiconductor materials
(320.7090) Ultrafast optics : Ultrafast lasers
(350.5340) Other areas of optics : Photothermal effects

ToC Category:
Laser Microfabrication

Original Manuscript: October 15, 2009
Revised Manuscript: December 7, 2009
Manuscript Accepted: December 7, 2009
Published: January 15, 2010

Amirkianoosh Kiani, Krishnan Venkatakrishnan, and Bo Tan, "Direct patterning of silicon oxide on Si-substrate induced by femtosecond laser," Opt. Express 18, 1872-1878 (2010)

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