MTMO grayscale photomask
Optics Express, Vol. 18, Issue 3, pp. 2621-2631 (2010)
http://dx.doi.org/10.1364/OE.18.002621
Enhanced HTML
Acrobat PDF (699 KB)
Abstract
We present a new class of simple, cheap and stable grayscale photomasks based on the metal-transparent-metallic-oxides (MTMO) systems by laser direct writing in metal films. For obtaining high resolution and grainless grayscale patterns we developed a refinement method of the films, in which the nanometer size effect may play a significant role for the improvement. We propose a layered oxidation model and a grain model for the mechanism of In- and Sn-based MTMO systems. The masks have a wide application wavelength range at least from 350 to 700 nm. Three-dimensional microstructures have been successfully fabricated by using the MTMO grayscale masks.
© 2010 OSA
OCIS Codes
(160.3900) Materials : Metals
(160.4236) Materials : Nanomaterials
(310.6845) Thin films : Thin film devices and applications
(110.6895) Imaging systems : Three-dimensional lithography
ToC Category:
Imaging Systems
History
Original Manuscript: December 8, 2009
Revised Manuscript: January 12, 2010
Manuscript Accepted: January 12, 2010
Published: January 25, 2010
Citation
Chuan Fei Guo, Jianming Zhang, Junjie Miao, Yongtao Fan, and Qian Liu, "MTMO grayscale photomask," Opt. Express 18, 2621-2631 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-3-2621
Sort: Year | Journal | Reset
References
- J. D. Rogers, A. H. O. Kärkkäinen, T. Tkaczyk, J. T. Rantala, and M. R. Descour, “Realization of refractive microoptics through grayscale lithographic patterning of photosensitive hybrid glass,” Opt. Express 12(7), 1294–1303 (2004). [CrossRef] [PubMed]
- K. Reimer, H. J. Quenzer, M. Jürss, and B. Wagner, “Micro-optic fabrication using one-level gray-tone lithography,” Proc. SPIE 3008, 279–288 (1997), http://www.mp-cc.de/docs/reiphot.pdf . [CrossRef]
- M. Christophersen and B. F. Phlips, “Gray-tone lithography using an optical diffuser and a contact aligner,” Appl. Phys. Lett. 92(19), 194102 (2008). [CrossRef]
- C. M. Waits, A. Modafe, and R. Ghodssi, “Investigation of gray-scale technology for large area 3D siliconMEMS structures,” J. Micromech. Microeng. 13(2), 170–177 (2003). [CrossRef]
- C. K. Wu, “Method of making high energy beam sensitive glasses,” U.S. Patent, No. 5,078,771 (1992).
- G. Gal, “Method for fabricating microlenses,” U.S. Patent No. 5,310,623, 10, (1994).
- C. G. Granqvist and A. Hultaker, “Transparent and conducting ITO films: new developments and applications,” Thin Solid Films 411(1), 1–5 (2002). [CrossRef]
- Z. W. Pan, Z. R. Dai, and Z. L. Wang, “Nanobelts of semiconducting oxides,” Science 291(5510), 1947–1949 (2001). [CrossRef] [PubMed]
- E. Comini, “Metal oxide nano-crystals for gas sensing,” Anal. Chim. Acta 568(1-2), 28–40 (2006). [CrossRef] [PubMed]
- B. Krishnamachari, J. McLean, B. Cooper, and J. Sethna, “Gibbs-Thomson formula for small island sizes: Corrections for high vapor densities,” Phys. Rev. B 54(12), 8899–8907 (1996). [CrossRef]
- E. P. Domashevskaya, O. A. Chuvenkova, V. M. Kashkarov, S. B. Kushev, S. V. Ryabtsev, S. Yu. Turishchev, and Yu. A. Yurakov, “TEM and XANES investigations and optical properties of SnO nanolayers,” Surf. Interface Anal. 38(4), 514–517 (2006). [CrossRef]
- C. K. Wu, “gray scale all-glass photomasks,” U.S. Patent No. 2005/0053844 A1, (2005).
- C. F. Guo, Z. Zhang, S. Cao, and Q. Liu, “Laser direct writing of nanoreliefs in Sn nanofilms,” Opt. Lett. 34(18), 2820–2822 (2009). [CrossRef] [PubMed]
- C. F. Guo, S. Cao, P. Jiang, Y. Fang, J. Zhang, Y. Fan, Y. Wang, W. Xu, Z. Zhao, and Q. Liu, “Grayscale photomask fabricated by laser direct writing in metallic nano-films,” Opt. Express 17(22), 19981–19987 (2009), http://www.opticsinfobase.org/abstract.cfm?URI=oe-17-22-19981 . [CrossRef] [PubMed]
Cited By |
OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.





OSA is a member of 