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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 3 — Feb. 1, 2010
  • pp: 2621–2631

MTMO grayscale photomask

Chuan Fei Guo, Jianming Zhang, Junjie Miao, Yongtao Fan, and Qian Liu  »View Author Affiliations

Optics Express, Vol. 18, Issue 3, pp. 2621-2631 (2010)

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We present a new class of simple, cheap and stable grayscale photomasks based on the metal-transparent-metallic-oxides (MTMO) systems by laser direct writing in metal films. For obtaining high resolution and grainless grayscale patterns we developed a refinement method of the films, in which the nanometer size effect may play a significant role for the improvement. We propose a layered oxidation model and a grain model for the mechanism of In- and Sn-based MTMO systems. The masks have a wide application wavelength range at least from 350 to 700 nm. Three-dimensional microstructures have been successfully fabricated by using the MTMO grayscale masks.

© 2010 OSA

OCIS Codes
(160.3900) Materials : Metals
(160.4236) Materials : Nanomaterials
(310.6845) Thin films : Thin film devices and applications
(110.6895) Imaging systems : Three-dimensional lithography

ToC Category:
Imaging Systems

Original Manuscript: December 8, 2009
Revised Manuscript: January 12, 2010
Manuscript Accepted: January 12, 2010
Published: January 25, 2010

Chuan Fei Guo, Jianming Zhang, Junjie Miao, Yongtao Fan, and Qian Liu, "MTMO grayscale photomask," Opt. Express 18, 2621-2631 (2010)

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