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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 4 — Feb. 15, 2010
  • pp: 3298–3310

Near-field ellipsometry for thin film characterization

Zhuang Liu, Ying Zhang, Shaw Wei Kok, Boon Ping Ng, and Yeng Chai Soh  »View Author Affiliations


Optics Express, Vol. 18, Issue 4, pp. 3298-3310 (2010)
http://dx.doi.org/10.1364/OE.18.003298


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Abstract

A near-field ellipsometry method is presented for nano-scale thin film characterization. The technique fuses the topographic and ellipsometric optical measurements that are simultaneously obtained by a scanning near-field optical microscopy (SNOM). It is shown that the proposed near-field ellipsometry is able to attain nano-scale lateral resolution and correct artifacts in characterization. The effectiveness of the proposed method is verified by simulation and experimental studies.

© 2010 Optical Society of America

OCIS Codes
(120.2130) Instrumentation, measurement, and metrology : Ellipsometry and polarimetry
(240.0310) Optics at surfaces : Thin films
(180.4243) Microscopy : Near-field microscopy

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: December 7, 2009
Revised Manuscript: January 24, 2010
Manuscript Accepted: January 25, 2010
Published: February 1, 2010

Citation
Zhuang Liu, Ying Zhang, Shaw Wei Kok, Boon Ping Ng, and Yeng Chai Soh, "Near-field ellipsometry for thin film characterization," Opt. Express 18, 3298-3310 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-4-3298


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