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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 5 — Mar. 1, 2010
  • pp: 4346–4355

Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source

Frank Barkusky, Armin Bayer, Stefan Döring, Peter Grossmann, and Klaus Mann  »View Author Affiliations

Optics Express, Vol. 18, Issue 5, pp. 4346-4355 (2010)

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We present first damage threshold investigations on EUV mirrors and substrate materials using a table-top laser produced plasma source. A Schwarzschild objective with Mo/Si multilayer coatings for the wavelength of 13.5 nm was adapted to the source, generating an EUV spot of 5 µm diameter with a maximum energy density of ~6.6 J/cm2. Single-pulse damage tests were performed on grazing incidence gold mirrors, Mo/Si multilayer mirrors and mirror substrates, respectively. For gold mirrors, a film thickness dependent damage threshold is observed, which can be partially explained by a thermal interaction process. For Mo/Si multilayer mirrors two damage regimes (spot-like, crater) were identified. Fused silica exhibits very smooth ablation craters, indicating a direct photon-induced bond breaking process. Silicon shows the highest damage threshold of all investigated substrate and coating materials. The damage experiments on substrates (fused silica, silicon, CaF2) were compared to excimer laser ablation studies at 157 nm.

© 2010 OSA

OCIS Codes
(140.3330) Lasers and laser optics : Laser damage
(340.7480) X-ray optics : X-rays, soft x-rays, extreme ultraviolet (EUV)

ToC Category:
Lasers and Laser Optics

Original Manuscript: December 22, 2009
Manuscript Accepted: January 23, 2010
Published: February 17, 2010

Virtual Issues
February 24, 2010 Spotlight on Optics

Frank Barkusky, Armin Bayer, Stefan Döring, Peter Grossmann, and Klaus Mann, "Damage threshold measurements on EUV optics using focused radiation from a table-top laser produced plasma source," Opt. Express 18, 4346-4355 (2010)

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