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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 5 — Mar. 1, 2010
  • pp: 4449–4456

Plasma power controlled deposition of SiOx with manipulated Si Quantum Dot size for photoluminescent wavelength tailoring

Bo-Han Lai, Chih-Hsien Cheng, Yi-Hao Pai, and Gong-Ru Lin  »View Author Affiliations

Optics Express, Vol. 18, Issue 5, pp. 4449-4456 (2010)

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Plasma power controlled PECVD of SiOx under SiH4/N2O gas mixture with manipulated Si quantum dot (Si-QD) size for tailoring photoluminescent (PL) wavelength is demonstrated. The incomplete decomposition of N2O at high plasma power facilitates Si-rich SiOx deposition to enlarge O/Si composition ratio and to shrink Si-QD size. As RF plasma power increases from 20 to 70 W, the O/Si ratio is increased from 1 to 1.6 and the average Si-QD size is reduced from 4.5 to 1.7, which increases Si-QD density from 3.2 × 1017 to 3.02 × 1018 cm−3 and blue-shifts PL wavelength from 780 to 380 nm.

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OCIS Codes
(250.5230) Optoelectronics : Photoluminescence
(310.1860) Thin films : Deposition and fabrication
(160.4236) Materials : Nanomaterials

ToC Category:

Original Manuscript: June 4, 2009
Revised Manuscript: November 25, 2009
Manuscript Accepted: November 29, 2009
Published: February 19, 2010

Bo-Han Lai, Chih-Hsien Cheng, Yi-Hao Pai, and Gong-Ru Lin, "Plasma power controlled deposition of SiOx with manipulated Si Quantum Dot size for photoluminescent wavelength tailoring," Opt. Express 18, 4449-4456 (2010)

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